Crystal Growth of Thallium Containing III-V Semimetal-Semiconductor Alloys and Search of New Physical Properties
Crystal Growth of Thallium Containing III-V Semimetal-Semiconductor Alloys and Search of New Physical Properties
批准号:
09650015
负责人:
ASAHI Hajime
金额:
$1.92万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998
中文摘要
用气体源分子束外延法在InP衬底上生长了四元半导体TlInGaAs、TlInGaP,X射线衍射和电子探针测试证实了TlInGaAs和TlInGaP的成功生长。发现TlInGaAs的Tl组分随生长过程中Tl流量的增加而增加。光致发光(PL)结果表明,掺铊的TlInGaAs样品的带隙随温度的变化比GaAs,InP和InAs的带隙随温度的变化慢,掺铊6%的TlInGaAs样品的带隙随温度的变化比GaAs,InP和InAs的带隙随温度的变化慢。我们还生长了InP/TlInGaAs/InP的双异质结结构,X射线衍射和电子探针分析表明,这种双异质结结构的界面上没有发生III族原子的相互扩散,而且,我们观察到DH结构的形成使TlInGaAs层的光致发光强度增强,通过测量光电导谱的温度依赖性,我们还观察到TlInGaP的带隙能量的温度变化变慢。首次观察到了TIP的拉曼信号,其拉曼峰位于InP的低波数处,表明TlInGaAs在温度无关的波长激光二极管中有应用前景。
英文摘要
Quaternary semiconductors TlInGaAs, TlInGaP were grown on InP substrates by gas source MBE using elemental Tl, In and Ga, and thermally cracked arsine and phosphine.Substrate temperature during growth was 450゚C.X-ray diffraction and EPMA measurements confirmed the successful growth of TlInGaAs and TlInGaP.It was found that Tl composition of TlInGaAs increases with Tl flux during growth.Photoluminescence (PL) emission was observed from the grown TlInGaAs.PL peak wavelength was observed to increase with Tl composition and it was found that the bandgap is decreased by incorporation of Tl.Temperature dependence of PL spectra showed that the temperature variation of bandgap energy is slower than those of GaAs, InP and InAs.For the TlInGaAs with Tl composition of 6%, nearly temperature-independent bandgap energy was observed.This result agrees well with our expected properties.We also have grown the double-hetero (DH) structure of InP/TlInGaAs/InP.From the X-ray diffraction and EPMA measurements on this DH structure showed that the interdiffusion of group III atoms at the interfaces was not occurred.Furthermore, we have observed the enhancement of PL intensities from TlInGaAs layer by the formation of DH structures.Slower temperature variation of bandgap energy was also observed for TlInGaP by the measurement of temperature dependence of photoconductance spectra.We have observed the TIP Raman signals for the first time.The Raman peaks were located at lower wavenumbers of those of InP.It was suggested that TlInGaAs is promising for the application to the temperature-independent wavelength laser diodes.
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H.Koh: "Photoconductance measurement on TlInGaP grown by gas source MBE" J.Crystal Growth. 188. 107-112 (1998)
H.Koh:“气源 MBE 生长的 TlInGaP 的光电导测量”J.Crystal Growth。
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作者:
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通讯作者:
H.Koh, H.Asahi, M.Fushida, K.Yamamoto, K.Asami, S.Gonda, K.Oe: ""Photoconductance measurement on TlInGaP grown by gas source MBE"" J.Crystal Growth. 188. 107-112 (1998)
H.Koh、H.Asahi、M.Fushida、K.Yamamoto、K.Asami、S.Gonda、K.Oe:“通过气体源 MBE 生长的 TlInGaP 的光电导测量”J.Crystal Growth。
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H.Asahi: "Gas source MBE growth and characterization of TlInGaP and TlInGaAs layers for long wavelength applications" J.Crystal Growth. (印刷中). (1999)
H.Asahi:“用于长波长应用的 TlInGaP 和 TlInGaAs 层的气源 MBE 生长和表征”J.Crystal Growth(正在出版)。
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H.Asahi, M.Fushida, K.Yamamoto, K.Iwata, H.Koh, K.Asami, S.Gonda and K.Oe: ""New semiconductors TlInGaP and their gas source MBE growth"" J.Crystal Growth. 175/176. 1195-1199 (1997)
H.Asahi、M.Fushida、K.Yamamoto、K.Iwata、H.Koh、K.Asami、S.Gonda 和 K.Oe:“新型半导体 TlInGaP 及其气源 MBE 生长”J.Crystal Growth。
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通讯作者:
M.Fushida, H.Asahi, K.Yamamoto, H.Koh, K.Asami, S.Gonda, K.Oe: ""TlGaP layrs grown on GaAs substrates by gas source MBE"" Jpn.J.Appl.Phys.36(6A). L665-L667 (1997)
M.Fushida、H.Asahi、K.Yamamoto、H.Koh、K.Asami、S.Gonda、K.Oe:“通过气体源 MBE 在 GaAs 衬底上生长的 TlGaP 层” Jpn.J.Appl.Phys。
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共 22 条
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Study on Temperature-independent Lasing Wavelength Semiconductor Laser Diodes by Using T1-containing III-V Semiconductors
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Study on Polycrystalline Photonics, by Using III-V Nitrides Grown on Amorphous and Polycrystalline Substrates
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批准号:11450015
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.93万
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负责人:ASAHI Hajime
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