Study on Temperature-independent Lasing Wavelength Semiconductor Laser Diodes by Using T1-containing III-V Semiconductors
Study on Temperature-independent Lasing Wavelength Semiconductor Laser Diodes by Using T1-containing III-V Semiconductors
批准号:
11555004
负责人:
ASAHI Hajime
金额:
$4.03万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2001
中文摘要
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英文摘要
Laser diodes (LDs), which operate without changing wavelength irrespective of ambient temperature variation, are important for WDM optical fiber communication system. We proposed new alloy semiconductors, T1InGaAs and T1InGaP, for temperature-stable wavelength LDs. We succeeded in the growth of these new semiconductors on InP substrates at 440-450 ℃ by gas source MBE. The T1 composition was confirmed to increase with T1 flux during growth. The bandgap energies and their temperature variations decreased with increasing T1 composition, as we expected. Especially, for the T1InGaAs with T1 composition of 13%, we observed very small temperature variation of PL peak wavelength of 0.04 nm/K, which is much smaller than that (0.1 nm/K) of the lasing wavelength of InGaAsP/InP-DFB LDs. We observed similar small temperature variation of the EL peak energy for the T1InGaAs/InP DH LDs and realized the room temperature pulsed operation. The threshold current density was 5 kA/cm^2 and the T0 value was 85K. We, furthermore, proposed TlInGaAsN and TlInGaPN for the application to temperature-stable wavelength and threshold current LDs and the preliminary result was obatined; growth of T1InGaAs on GaAs and red-shift of P1 peak energy with T1 composition).
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Y.K.Zhou: "Gas source MBE growth Tl-based III-V semiconductors and their Raman scattering characterization"J. Cryst. Growth. 209. 547-551 (2000)
周Y.K.周:“气源MBE生长Tl基III-V族半导体及其拉曼散射表征”J.
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作者:
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通讯作者:
H. Asahi, K. Konishi, O. Maeda, A. Ayabe, H.J. Lee, A. Mizobata, K. Asami and S. Gonda: "Gas source MBE growth of T1InGaAs/InP DH structures for the application to WDM optical fiber communication systems"J. Cryst. Growth. 227/228. 307-312 (2001)
H. Asahi、K. Konishi、O. Maeda、A. Ayabe、H.J. Lee、A. Mizobata、K. Asami 和 S. Gonda:“T1InGaAs/InP DH 结构的气源 MBE 生长应用于 WDM 光纤通信
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H.J. Lee, K. Konishi, O. Maeda, A. Mizobata, K. Asami and H. Asahi: "Temperature-stable wavelength T1InGaAs/InP double heterostructure light-emitting diodes grown by gas source molecular beam epitaxy"Jpn. J. Appl. Plays.. 41(2B). 1168-1170 (2002)
H.J. Lee、K. Konishi、O. Maeda、A. Mizobata、K. Asami 和 H. Asahi:“通过气源分子束外延生长的温度稳定波长 T1InGaAs/InP 双异质结构发光二极管”Jpn。
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H.J.Lee: "Gas source MBE growth of TlInGaAs layers on GaAs substrates"Jpn. J. Appl. Phys.. 41(2B). 1016-1018 (2002)
H.J.Lee:“GaAs 衬底上 TlInGaAs 层的气源 MBE 生长”Jpn。
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通讯作者:
H.Asahi: "Gas source MBE growth of TlInGaAs/InP DH structures for the application to WDM optical fiber communication systems"J.Crystal Growth. (in press). (2001)
H.Asahi:“用于 WDM 光纤通信系统的 TlInGaAs/InP DH 结构的气源 MBE 生长”J.Crystal Growth。
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共 36 条
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批准号:21360010
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$12.06万
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财政年份:2009
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负责人:ASAHI Hajime
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依托单位:
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资助金额:$8.64万
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财政年份:2003
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依托单位:
Study on Polycrystalline Photonics, by Using III-V Nitrides Grown on Amorphous and Polycrystalline Substrates
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批准号:11450015
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.93万
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财政年份:1999
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负责人:ASAHI Hajime
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依托单位:
Crystal Growth of Thallium Containing III-V Semimetal-Semiconductor Alloys and Search of New Physical Properties
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批准号:09650015
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.92万
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负责人:ASAHI Hajime
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依托单位: