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Generation and migration of plasma-induced defects in III-nitride semiconductors

Generation and migration of plasma-induced defects in III-nitride semiconductors
III族氮化物半导体中等离子体诱导缺陷的产生和迁移
批准号:
26390056
负责人:
NAKAMURA Seiji
金额:
$3.0万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2014
资助国家:
日本
项目状态:
已结题
起止时间:
2014-04-01 至 2017-03-31

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期刊论文(1)
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DOI: --
发表时间: 2014
期刊:
影响因子: --
作者: [M.OMPRAKASH, V. NIRMAL KUMAR, M.ARIVANANDHAN, T.KOYAMA, Y.MOMOSE, H.IKEDA, H.TATSUOKA, Y.OKANO, T.OZAWA, Y.INATOMI, S.MOORTHY BABU and Y.HAYAKAWA, 横山大樹,中村成志,奥村次徳]
通讯作者: 横山大樹,中村成志,奥村次徳
Saliva as a potential tool for diagnosis of dry mouth including Sjogren's syndrome
  • 批准号:
    23659949
  • 项目类别:
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  • 资助金额:
    $2.33万
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    2011
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    $2.16万
  • 财政年份:
    2009
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  • 依托单位:
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  • 批准号:
    20390518
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 资助金额:
    $9.82万
  • 财政年份:
    2008
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Analysis of pathogenesis and establishment of novel diagnostic strategy of oral mucosal diseases by T cell receptor-based analysis
  • 批准号:
    15390618
  • 项目类别:
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  • 资助金额:
    $9.28万
  • 财政年份:
    2003
  • 负责人:
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海外基金