Methods for Determining Migration Properties of Point Defects in Metal Oxides
金属氧化物中点缺陷迁移特性的测定方法
基本信息
- 批准号:60550461
- 负责人:
- 金额:$ 1.22万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for General Scientific Research (C)
- 财政年份:1985
- 资助国家:日本
- 起止时间:1985 至 1986
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The objective of the project is to find out methods for determining migration properties of point defects in metal oxides through observations of defect aggregations during irradiation in a high voltage electron microscope. Results have been obtained on dislocation loop kinetics and migration energies of point defects in MgO, <Al_2> <O_3> and Mg <Al_2> <O_4> , and they are summerized as follows:1. The volume density <C_L> and the diameter D of loops in MgO are shown for MgO as a function of the electron flux <phi> , irradiation time t and irradiation temperature T by <C_L> <proportion> <phi^(1/2)> <t^theta> /( <M_I> ) <^(1/2)> and D <proportion> <t^(1/3)> for T<900K and by D <phi^(1/2)> <M_U> for T>900K, where <M_I> and <M_U> are respectively the mobility of interstitials and vacancies. The experimental results on <C_L> and D give the migration energies of the siower interstitial and vacancy as 0.05 eV and 2.0 eV, respectively.2. The dependence of <C_L> and D on <phi> and t for <Al_2> <O_3> containing holes is expressed by <C_L> <proportion> <phi^2> t/ <M_I> <Cu_O^2> and D <phi> t/ <Cu_O> , where <Cv_O> is the concentration of holes, yielding migration energy of interstitials as 0.76 eV.3. No loop is detected in chemically polished Mg <Al_2> <O_4> irradiated by 1 MeV electrons at 100-1000K. Mg <Al_2> <O_4> irradiated by 6 keV <Ar^+> ions, on the other hand, shows tinny loops, which are 1/6<111> interstitial type in character and are not stable under 1 MeV electron irradiation. A study on the mechanism of the dislocation loop behavior for Mg <Al_2> <O_4> is under the progress.
该项目的目的是通过在高压电子显微镜中观察辐照过程中的缺陷聚集,找出确定金属氧化物中点缺陷迁移特性的方法。本文对MgO、Mg中位错环动力学和点缺陷迁移能进行了研究<Al_2><O_3><Al_2><O_4>。MgO<C_L>中的环的体积密度和直径D对于MgO作为电子通量<phi>、辐照时间t和辐照温度T的函数示出,对于T<900 K,为<C_L><proportion><phi^(1/2)> <t^θ> /(<M_I>)<^(1/2)>和D <proportion><t^(1/3)>,对于T> 900 K,为D <phi^(1/2)><M_U>,其中<M_I>和<M_U>分别是材料和空位的迁移率。对和D的实验结果<C_L>给出了较低间隙原子和空位的迁移能分别为0.05 eV和2.0 eV.含<C_L>空穴时,和D对<phi>和t<Al_2>的依赖关系<O_3>表示为<C_L><proportion><phi^2> t/<M_I><Cu_O^2>和D <phi>t/<Cu_O>,其中<Cv_O>D t/是空穴的浓度,从而得到电子的迁移能为0.76 eV。在<Al_2><O_4>100- 1000 K温度范围内,用1 MeV电子辐照化学抛光的Mg样品,未发现环。另<Al_2><O_4>一方面,用6 keV的<Ar^+>离子辐照Mg,则显示出细小的环,其特征为1/6<111>间隙型,在1 MeV的电子辐照下不稳定。对镁合金位错环行为机制的研究<Al_2><O_4>正在进行中。
项目成果
期刊论文数量(7)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
C. Kinoshita: "Electron Irradiation-Induced Transformations in Alloys and Ceramics" J. Electron Microscopy. 34. 299-310 (1985)
C. Kinoshita:“合金和陶瓷中的电子辐照诱导转变”J. 电子显微镜。
- DOI:
- 发表时间:
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- 影响因子:0
- 作者:
- 通讯作者:
C. Kinoshita: "Migration Energies of Interstitials and Vacancies in MgO" Advances in Ceramics. 10. 490-505 (1985)
C. Kinoshita:“MgO 中间隙原子和空位的迁移能量”陶瓷进展。
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- 影响因子:0
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- 通讯作者:
Chiken KINOSHITA: Proc.of Int.Symp.on Behavior of Lattice Imperfections in Materials. 213-218 (1986)
Chiken KINOSHITA:Proc.of Int.Symp.on 材料中晶格缺陷的行为。
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- 影响因子:0
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Chiken KINOSHITA: J.Electron Microscopy. 34. 299-310 (1985)
Chiken KINOSHITA:J.电子显微镜。
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- 影响因子:0
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KINOSHITA Chiken其他文献
KINOSHITA Chiken的其他文献
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{{ truncateString('KINOSHITA Chiken', 18)}}的其他基金
Research and development of highly equipped experimental technique for materials in light water reactors
轻水堆材料高装备实验技术研发
- 批准号:
07558070 - 财政年份:1995
- 资助金额:
$ 1.22万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
結晶の照射効果に及ぼす電子励起および格子励起の相乗効果
电子和晶格激发的协同效应对晶体辐照效应的影响
- 批准号:
07455260 - 财政年份:1995
- 资助金额:
$ 1.22万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Concurrent Effects of Electronic and Lattia Excitations and Electric Field on Electrical Conductirity
电子和拉蒂亚激励以及电场对电导率的同时影响
- 批准号:
04650601 - 财政年份:1992
- 资助金额:
$ 1.22万 - 项目类别:
Grant-in-Aid for General Scientific Research (C)
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