Magnetic properties of compositionally modulated alloy films

成分调制合金薄膜的磁性能

• 批准号: 61550227
• 负责人: TSUNASHIMA Shigeru
• 金额: $ 1.28万
• 依托单位: Nagoya University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1986
• 资助国家: 日本
• 起止时间: 1986 至 1987
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-61550227/
• 关键词: Magnetic thin films; magnetization process; magnetic anisotropy; super lattice; multilayer films; Gadolinium; Erbium; 磁化曲線; ガドリニゥム, コバルト; 薄膜; 磁性膜; 組成変調膜; アモルファス合金

(1)Magnetization Process of Gd/Co multilayer films Gd/co multilayer films were prepared by electron beam evaporation in a vacuum of -10^<-7>Torr. The multilayer film of (110A Gd/147A Co) X 12 showed peculiar magnetization process around 150 K. This can be attributed to a transition of gd spins from aligned to twisted states.(2)Perpendicular anisotropy of bias modulated ErCo sputtered films Perpendicular anistropy in bias modulated ErCo sputtered films has been investigated. ErCo single layer film with or without substrate bias has in-plane magnetization, while multilayered film formed by the bias modulation has perpendicular magnetization when the modulation period is in the range of 30-60A.

（1）Gd/Co多层膜的磁化过程在真空度为-10 ° Torr的条件下，用电子束蒸发法制备了Gd/Co多层膜<-7>。（110 A Gd/147 A Co）X12多层膜在150 K附近表现出特殊的磁化过程。这可以归因于Gd自旋从排列态到扭曲态的转变。（2）偏压调制ErCo溅射薄膜的周期各向异性研究了偏压调制ErCo溅射薄膜的周期各向异性。当调制周期在30- 60 A范围内时，有衬底偏压和无衬底偏压的ErCo单层膜都具有面内磁化，而由偏压调制形成的多层膜具有垂直磁化。

项目成果

縄手雅彦: 第11回日本応用磁気学会学術講演概要集. 60 (1987)

绳手正彦：第 11 届日本应用磁学学会学术讲座摘要 60（1987）。

N. Nawate: Proceedings of International Conference on Magnetism. (1988)

N. Nawate：国际磁学会议论文集。

S. Tsunashima; T. Ichikawa; M. Nawate; S. Uchiyama: "Magnetization process of Gd/Co multilayer films" Jounal de Physique Supplement.

S.纲岛；

T. Ichikawa; S. Tsunashima; S. Uchiyama: "Magnetic properties of Gd/Co Compositionally Modulated thin films" Technical reports of the Institute of Electronics and Information Engineers. CPM 86-122. 41-48 (1987)

T.市川；

M. Nawate; S. Tsunashima; S. Uchiyama: "Perpendicular anisotropy of bias modulated ErCo sputterd films" J. Appl. Phys.64. 5437-5439 (1988)

M.绳手；