Research on Instantaneous Electrical and Optical Characterization systems for Alloy Semiconductors
Research on Instantaneous Electrical and Optical Characterization systems for Alloy Semiconductors
批准号:
61550304
负责人:
HONGO Shozo
金额:
$1.41万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1986
资助国家:
日本
项目状态:
已结题
起止时间:
1986 至 1987
中文摘要
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英文摘要
1. The multiple sampling method with minimal time-resolution of 100 nsec has been applied to the DLTS (Deep Level Transient Spectroscopy)/ C-V(Capacitance-Voltage measurement) systems.Consequently, elctrical characterization of compound semiconductors has been successfully performed within several tens minutes by this system.2. As for reduction of noise associated with the measurement, the synchronous summation and/or digital low-pass filter for the signal processing are adopted in this system.The S/N (Signal Noise Rateio) has been improved up to 40 dB which was not achieved by the conventional analogue jntegrator/ signal averager.3. This system has been successfully applied to the characterization of lattic-mismatched heaterojunction: GaInAs/GaAs;(1)A hole tyap with the activation energy of 0.63 eV and the cross section of 1x 10 -14 cm 2 exists in the neighborhood of the heterointerface to the amount of 2 x 10 14 cm -3. This hole trap is proved to be related to the strain at the hetero-interface.(2)The conduction band discontinuity of this hetero-interface is which follows the 0.64* Ec rule.
期刊论文(3)
专著(0)
科研奖励(0)
会议论文
M.Ogawa: Record of Alloy Semi-conductor Physics and Electronics Symposium. (1987)
M.Okawa:合金半导体物理与电子学研讨会记录。
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作者:
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通讯作者:
M.Ogawa;K,Kagotani;S.Hongo;Y.Watanabe;N.Sano;H.Kato;M.Nakayama: Jpn.J.Appl.Phys.
M.Okawa;K,Kagotani;S.hongo;Y.Watanabe;N.Sano;H.Kato;M.Nakayama:Jpn.J.Appl.Phys。
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发表时间:
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作者:
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通讯作者:
N. Ogawa, K. Kagotani, S. Hongo, Y. Watanabe, N. Sano, H. Kato, M.N akayama: "Characterization of Lattice Mismatched Hetero-Interface" JPN J. Appl. Phys.
N. Okawa、K. Kagotani、S. Hongo、Y. Watanabe、N. Sano、H. Kato、M.N akayama:“晶格不匹配异质接口的表征”JPN J. Appl。
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作者:
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通讯作者:
Realization of long time stable negative electron affinity surface and production of efficient emitter
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批准号:15560019
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.24万
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财政年份:2003
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负责人:HONGO Shozo
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依托单位:
Electron emission mechanism from negative electron affinity surface and production of highly efficient electron emitter
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批准号:13650027
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.98万
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财政年份:2001
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负责人:HONGO Shozo
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依托单位:
Fundamental Research on Observation and Control of Hydrogen Related Reaction in Semiconductor Surfaces
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批准号:09650031
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$0.45万
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财政年份:1997
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负责人:HONGO Shozo
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依托单位: