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Electron emission mechanism from negative electron affinity surface and production of highly efficient electron emitter

Electron emission mechanism from negative electron affinity surface and production of highly efficient electron emitter
负电子亲和力表面的电子发射机理及高效电子发射体的制备
批准号:
13650027
负责人:
HONGO Shozo
金额:
$1.98万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2001
资助国家:
日本
项目状态:
已结题
起止时间:
2001 至 2002

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中文摘要
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英文摘要
1) Oxidation process of Cs adsorbed on CVD diamond surfaces was investigated. The oxidation process is the same as that of Si and GaAs. Namely, with the adsorption of oxygen, oxide, peroxide and superoxide were formed. Superoxide is chemically stable upon oxygen exposure.2) Silicon and gallium arsenide with cesium on their surface is oxidized very easily. On the contrary diamond with cesium on the surface is not oxidized.3) As the result, the potential layer to disturb electron emission from the surface is not formed. This enables the stable electron emission after oxygen exposure. This fact is very important to realize practical electron emitters.4) Barium adsorbed diamond surface was also studied. The oxidation process is similar to the case of cesium adsorption. Barium adsorbed diamond surface is also potential for electron emitters.5) It was found from desorption spectrum study that barium layer deposited on diamond is thermostable up to 400℃.6) Electron emission from Cs deposited diamond surface was measured. Threshold field for electron emission was 0.8 V/μm. Emission current density of 2 μA/mm^2 was obtained for the field strength of 15 V/μm. It was fairly stable to time and exposure to air. Luminescence from ITO used for an anode was confirmed.
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Realization of long time stable negative electron affinity surface and production of efficient emitter
  • 批准号:
    15560019
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
  • 资助金额:
    $2.24万
  • 财政年份:
    2003
  • 负责人:
    HONGO Shozo
  • 依托单位:
Fundamental Research on Observation and Control of Hydrogen Related Reaction in Semiconductor Surfaces
  • 批准号:
    09650031
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
  • 资助金额:
    $0.45万
  • 财政年份:
    1997
  • 负责人:
    HONGO Shozo
  • 依托单位:
Research on Instantaneous Electrical and Optical Characterization systems for Alloy Semiconductors
  • 批准号:
    61550304
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)
  • 资助金额:
    $1.41万
  • 财政年份:
    1986
  • 负责人:
    HONGO Shozo
  • 依托单位:
海外基金