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Ultra-low Friction Behavior during Gas Adsorption to a Hard Amorphous Carbon Film

Ultra-low Friction Behavior during Gas Adsorption to a Hard Amorphous Carbon Film
硬质非晶碳膜气体吸附过程中的超低摩擦行为
批准号:
63550105
负责人:
IDE Takashi
金额:
$1.34万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1988
资助国家:
日本
项目状态:
已结题
起止时间:
1988 至 1989

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中文摘要
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英文摘要
On a hard amorphous carbon film prepared by electrostatic impact-deposition of carbon black particle, the ultra-low friction behavior under the surface adsorption of gas molecules was investigated by evaluating the structure and the boundary lubrication properties of the film, and the following results are obtained;1.The carbon film is composed with graphitic phase of starting material and its impact-subjected one of amorphous structure, including numerous defects such as dangling bond of carbon. For the film heating beyond 100 C, the amorphous structure gradually transforms to graphitic phase, which reads to the increase in the density of dangling bond.2.Surface adsorption condition for ultra-low friction was revealed with a sliding friction experiment in several atmospheric gases, using the reciprocating motion between coated ball and disc specimens in the manner that the contact point describes a same locus repeatedly. And the following results are obtained; (1)Very low friction was attained for the density state of gas adsorption of hydrogen, water and nitrogen, especially in hydrogen atmosphere the frictional coefficient became of below 0.01. However, it is proved that oxygen gas promotes the interfacial adhesion of carbon film under frictional action. (2)It was clarified that the boundary lubrication in air is considerably affected by water adsorption. In the present experimental condition of reciprocating friction, the low water adsorption for low friction can be attained in an appropriate equilibrium of the desorption and adsorption rates; the former can be dominated by the friction condition, and the latter can be by the atmospheric condition and film quality such as the content of graphite and surface radical.
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  • 批准号:
    22580143
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
  • 资助金额:
    $3.0万
  • 财政年份:
    2010
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    14350388
  • 项目类别:
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  • 资助金额:
    $3.65万
  • 财政年份:
    2002
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    IDE Takashi
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Formation of Diamond-Like Carbon Film by Electrostatic Microparticle-Impact-Deposition Using Assistance of Ion Beam and Plasma
  • 批准号:
    12650716
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
  • 资助金额:
    $2.24万
  • 财政年份:
    2000
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Development of functional film processing using ultra-fine particle beam
  • 批准号:
    05452139
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
  • 资助金额:
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  • 财政年份:
    1993
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  • 依托单位:
海外基金