Formation of Diamond-Like Carbon Film by Electrostatic Microparticle-Impact-Deposition Using Assistance of Ion Beam and Plasma

利用离子束和等离子体辅助的静电微粒冲击沉积形成类金刚石碳膜

• 批准号: 12650716
• 负责人: IDE Takashi
• 金额: $ 2.24万
• 依托单位: Ehime University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2000
• 资助国家: 日本
• 起止时间: 2000 至 2001
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-12650716/
• 关键词: Diamond-like Carbon Film; Carbon Ultra-fine Particle; Electrostatic Acceleration; Assistance of Magnetic and RF Electric Field; Film Growth Rate; Characteristic of Boundary Friction; Effect of Mapnetron Sputtering; Hopping Conduction; DLC膜; 高周波プラ

(1) Effect of assistance of the magnetic and rf electric fields, and characteristics of the deposited DLC film in microparticle impact coating(a) When assisted with only magnetic field, the film growth rate increased by about 11.3 times compared with the present dc method. In addition of rf field, it increased by about as much as 14.7 times.(b) The resistivity of the DLC film and its temperature coefficient increased by applying of electromagnetic field, though the film growth rate decreased. This suggests microstructure of the film changed into an amorphous phase.(c) As for the relation between the microstructure and the boundary friction characteristic of the film, the behavior of the boundary friction appears strongly in the DLC film with a high content of amorphous phase, which may be due to the high heat of adsorption of adsorbed gas molecule.(2) Effect of assistance of ion beam in the microparticle beam processing method, and the research on film formation mechanism(a) The experimental method to clarify the charging phenomenon of microparticle was examined for evaluating of microparticle impact energy, the electron beam irradiation device having a large stable current output was designed and manufactured.(b) As for the method for making aggromerated microparticles minute and supplying to the charging device, the electrostatic pulverizing method may be used for the charging experiment.

(1)磁场和射频电场的辅助作用以及微粒冲击涂层中沉积的DLC膜的特性（a）当仅用磁场辅助时，膜的生长速率与目前的直流方法相比增加了约11.3倍。加上射频场，它增加了大约14.7倍。(b)施加电磁场后，DLC膜的电阻率和温度系数增大，但生长速率降低。这表明薄膜的微观结构转变为非晶相。(c)在薄膜的微观结构与边界摩擦特性之间的关系方面，非晶相含量高的DLC薄膜表现出强烈的边界摩擦行为，这可能是由于吸附气体分子的高吸附热所致。(2)微粒束加工方法中离子束的辅助效果及成膜机理的研究（a）为了评价微粒的撞击能量，对阐明微粒带电现象的实验方法进行了研究，设计并制造了具有大的稳定电流输出的电子束照射装置。(b)至于使聚集的微粒微小化并供应到充电装置的方法，静电粉碎法可用于充电实验。