Study on The Emission Mechanism of Rare Earth Ions in Semiconductors and Its Application
Study on The Emission Mechanism of Rare Earth Ions in Semiconductors and Its Application
批准号:
01550240
负责人:
KIMURA Tadamasa
金额:
$1.73万
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1989
资助国家:
日本
项目状态:
已结题
起止时间:
1989 至 1991
中文摘要
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英文摘要
The most important result that was found during this three year research done with a help of Grant-in-aid for Scientific Research is that we succeeded for the first time in observing the 1.54mum emission due to the 4f intrashell transition of Er^<3+> ions ( ^4I_<13/2>-> ^4I_<15/2>) which are doped in InP by ion implantation by means of a new excitation method, that is, electron impact excitation. Study on the emission of rare earth ions doped in III-V compound semiconductors and in Si semiconductor had been mostly carried out using the energy transfer mechanism from the recombination of electrons and holes which were generated by illumination (photoluminescence) or injected into a pn junction (LED). The problem was a low emission efficiency for lasing, thermal quenching at high temperatures, and little understanding of the precise energy transfer and non-radiative transition mechanisms. We have found that the 1.54 mum emission characteristics of the Er^<3+> ions in InP (spectrum and th … More e temperature dependence of the intensity) were different in essential between photoluminescence and impact excitation. We made a detailed comparison of the emission characteristics between photoluminescence and impact excitation, which made a great contribution to elucidating the emission mechanisms of rare earth ions doped in crystalline semiconductors. The following studies were carried. 1) Er-doping process into InP by means of ion implantation, 2) Impact excitation emission of Er/InP. 3) Analysis of excitation and emission mechanisms of Er ions, 4) Evaluation of emission efficiency and impact cross section.In conclusion, there are various Er3^+ emission centers in InP, and different centers are excited between photoluminescnce and impact excitation. the non-radiative transition mechanism is also different for different centers. We are planning to study further on the emission mechanism, improve the emission efficiency and challenge the impact excitation emission of other rare earth ions in other semiconductors (especially in Si). Less
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T. Kimura, H. Isshiki, R. Saito, S. Yugo, and T. Ikoma: ""Impact Excitation Electroluminescence Spectra of Er ions in InP and the possibility of an efficient EL diode at 1.54mum"" Proceedings 1991 International Semiconductor Device Research Symposium, Cha
T. Kimura、H. Isshiki、R. Saito、S. Yugo 和 T. Ikoma:“InP 中 Er 离子的冲击激发电致发光光谱以及 1.54mum 高效 EL 二极管的可能性”1991 年国际半导体器件论文集
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H.Isshiki: "Characteristics of the Electroluminescence and photoluminescence Emissions of Erbium Ions Doped in InP and the Energy Transfer Mechanism" Journal of Applied Physics. 70. 6993-6998 (1991)
H.Isshiki:“InP掺杂铒离子的电致发光和光致发光特性及能量传递机制”应用物理学杂志。
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H.Isshiki: "Emissions of the 1.54μm Erirelated peaks by impact excitation of Er atoms in IuP and its characteristico" Physical concepts of Materials for Novel Optoelectronics Device Applicatiens 1:Matenials Growth and characterigation. 1361. 223-227 (1990
H.Isshiki:“IuP 中 Er 原子的冲击激发产生的 1.54μm Eri 相关峰的发射及其特征”用于新型光电子器件应用的材料的物理概念 1:材料生长和表征(1990 年)。
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H.Isshiki,H.Kobayashi,S.Yugo,T.Kimura and T.Ikoma: "Impact excitation of the Erbiumーrelated 1.54μm luminescence peak in Erbiumーdoped InP" Appl.Phys.Lett.58. 484 (1991)
H.Isshiki、H.Kobayashi、S.Yugo、T.Kimura 和 T.Ikoma:“掺铒 InP 中与铒相关的 1.54μm 发光峰的冲击激发”Appl.Phys.Lett.58(1991)。
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H.Isshiki: "Impact excitation of erbium-related 1.54 μm luminescence peak in erbium-doped InP" Applied Physico Letters. 58. 484-486 (1991)
H.Isshiki:“掺铒 InP 中与铒相关的 1.54 μm 发光峰的冲击激发”《应用物理学快报》58. 484-486 (1991)。
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共 23 条
Evaluation of energy migration between Er ions in the fluorescence process of ErYSiO silicate crystals.
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批准号:22560003
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.91万
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财政年份:2010
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负责人:KIMURA Tadamasa
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依托单位:
Research on methodological fundamentals of cyber ethnography
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批准号:19500210
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$3.0万
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财政年份:2007
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负责人:KIMURA Tadamasa
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依托单位:
Characterization of ErSiO superlattice crystals and development of light emitting devices for silicon photonics
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批准号:19360005
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$5.91万
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财政年份:2007
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负责人:KIMURA Tadamasa
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依托单位:
Fabrication of ErSiO self-organized superlattice thin films and evaluation of the 1.54μm optical waveguide amplification characteristics
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批准号:15360005
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$5.63万
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财政年份:2003
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负责人:KIMURA Tadamasa
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依托单位:
Dynamics of the Er1.54μm emission of Er-dope SiO_2/Si ultrathin multilayer structures
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批准号:12450008
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.61万
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财政年份:2000
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负责人:KIMURA Tadamasa
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依托单位:
The mechanism for the 1.54 mum luminescence of erbiumdoped porous silicon and the method of attaining a high efficiency.
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批准号:07455135
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.16万
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财政年份:1995
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负责人:KIMURA Tadamasa
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依托单位:
海外基金