Thin Film Formation by Particle Precipitation aided Chemical Vapor Deposition

化学气相沉积技术制备的超薄薄膜具有优越的电学和其他性能，成为半导体和材料领域的研究热点。为了充分利用这一材料元素的特性，应结合将膜层厚度和密度控制在均匀的操作条件，开发高效的CVD制造技术。从这个角度来看，本研究旨在探索颗粒沉淀辅助CVD技术中薄膜生成的基本机理，包括自成核、颗粒生长和颗粒在基底上的收集过程。以下是从调查中得出的结论。通过在基板上沉积颗粒制备薄膜的实验结果，实验明确了气体流动中颗粒产生和基板成膜的特性与气体压力、材料和气体温度、气体速度等操作参数的关系。考虑温度场和质量场的相互作用，分析了薄膜的形成过程，包括自成核、颗粒生长和颗粒在基体上的聚集等过程。通过与实验结果的比较，对成膜过程和颗粒的输运过程进行了分析。同时，还推导出了生产速度和颗粒直径与操作参数的关系。在此基础上，对PPCVD制膜工艺有了初步的认识。

The very thin film made by Chemical Vapor Deposition have so superior characteristics in electric and the other properties, that they can become the center of the attention to open up in semiconductor and material fields. To make the best use of this characteristics as an element of material, the high efficiency manufacturing technology of CVD should be developed in conjunction with the operating condition of control the film at uniform thickness and density. From the standpoint, this study has been conducted to pursue the basic mechanism of thin film production in the particle precipitation aided CVD techniques including the process of self- nucleation, particle growth, and particle collection on the base. The following are the summery deduced from the investigation.1. As the results of thin film manufacturing experiments by depositing particles on the base plate, the characteristics of the particle production in gas-flow and the film formation on the base were experimentally made clear in connection with the operating parameter such as the gas pressure, the material and gas temperature, and the gas velocity.2. The film production, consisted of the processes such as self-nucleation, growth of particle and collection of particles on the base, was analyzed taking into account the interaction between the temperature and mass fields. By comparison with the experimental results, the film production and the transport process of particles were clarified analytically. The production velocity and diameter of particle were also deduced in relation to the operating parameters.3. On the basis of the above findings, the fundamental knowledge of film manufacturing process by PPCVD were obtained.