A PRODUCTION OF AN ELECTROSTATIC SCANNING ELECTRON MICROSCOPE
A PRODUCTION OF AN ELECTROSTATIC SCANNING ELECTRON MICROSCOPE
批准号:
03650361
负责人:
KOTERA Masatoshi
金额:
$1.28万
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1991
资助国家:
日本
项目状态:
已结题
起止时间:
1991 至 1993
中文摘要
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英文摘要
The major demand for the scanning electron microsropy (SEM) has been in its high magnification, and the maximum resolution of around 0.5nm was attained. However, it is not always true that the current type of the SEM brings the best performance in all applications. The current SEM always uses an electromagnetic system for the electron lens and for the deflection, and it inherently has an inferiority in several characteristics, such as the magnetizing delay and the hysteresis. If we use the electrostatic system, image acquisition can be very fast and stable, and it will be a light and compact system and consume less electric power. Although the electrostatic SEM has been left behind the race to get higher spatial resolution because of the difficulties in electrical insulation and consume less electric power. Although the electrostatic SEM has been left behind the race to get higher spatial resolution because of the difficulties in electrical insulation and in the production of accurate … More shape of electrodes, it still has interesting features in a limited field, such as at low accelerating voltages. The aim of this research is to develop an electrostatic SEM, and this paper sumarizes several aspects in the development.Aspects concerned are the following : (1) vacuum system, (2) electron optics including the structure of the electron gun and voltages to be applied to every electrode, (3) signal detection using a photo-diode, (4) hard-ware and soft-ware of the scanning system of the electron beam, the signal processing system, the image analyzing system, and the interface to a personal computer, etc. Using the developed system, several electron beam parameters are obtained, and some SEM images are obtained. Since the resolution of the image obtained by the system is not sufficient, new electron optical system is proposed by a numerical calculation. At last, electron scattering phenomena in a specimen are simulated and the SEM signal contrast is theoretically obtained for a prediction of the surface topographic features. Less
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菅 博: "指定された電子ビーム軌道を得るための電極系の設計法" Memoirs of the Osaka Institute of Technology Series A. 36. 63-74 (1992)
菅浩:《获得指定电子束轨迹的电极系统的设计方法》大阪工业大学回忆录系列A.36.63-74(1992)
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通讯作者:
M.Kotera: "Theoretical Evaluation of a Topographic Contrast of Scanning Electron Microscope Images" Proc. 1991 Intn. Micro Process Conf.398-404 (1992)
M.Kotera:“扫描电子显微镜图像形貌对比度的理论评估”Proc。
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M.Kotera: "Simulation of Scanning Electron Microscape Image for Trench Structures" Scan. Microsc.32. 6281-6286 (1993)
M.Kotera:“沟槽结构扫描电子显微图像的模拟”扫描。
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山口 聡: "走査電子顕微鏡における画像コントラストのシミュレーションII" 日本学術振興会第132委員会. 研究会資料. 183-187 (1991)
Satoshi Yamaguchi:“扫描电子显微镜图像对比度的模拟 II”日本学术振兴会第 132 届委员会材料 183-187(1991)。
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小寺 正敏: "静電型走査電子顕微鏡の製作" 大阪工大摂南大学中研所報. 61-87 (1993)
Masatoshi Kodera:“静电扫描电子显微镜的制造”大阪工业大学节南大学中央研究所报告61-87(1993)。
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共 47 条
Multiscale analysis of charging phenomena to reduce the effects of charging in electron beam lithography
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批准号:16K06324
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$3.0万
-
财政年份:2016
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负责人:KOTERA Masatoshi
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依托单位:
Development of wide range-nanometer resolution-real time measurement system of charged up specimen irradiated by electron beam
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批准号:22560026
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.75万
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财政年份:2010
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负责人:KOTERA Masatoshi
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依托单位:
DEVELOPMENT OF AN IMAGING TECHNIQUE OF MAGNETIC FLUX PENETRATING THROUGH SUPERCONDUCTING FILM
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批准号:07650518
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.34万
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财政年份:1995
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负责人:KOTERA Masatoshi
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依托单位: