A PRODUCTION OF AN ELECTROSTATIC SCANNING ELECTRON MICROSCOPE

静电扫描电子显微镜的研制

• 批准号: 03650361
• 负责人: KOTERA Masatoshi
• 金额: $ 1.28万
• 依托单位: OSAKA INSTITUTE OF TECHNOLOGY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1991
• 资助国家: 日本
• 起止时间: 1991 至 1993
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-03650361/
• 关键词: Electrostatic Scanning Electron Microscope; Reflection Electron Image; Optimization of the Electron Optics; Simulation of Electron Beam Trajectory; Design of the System; 電子軌道シミュレ-ション; ディジタル電子ビ-ム走査; 反射電子検出

The major demand for the scanning electron microsropy (SEM) has been in its high magnification, and the maximum resolution of around 0.5nm was attained. However, it is not always true that the current type of the SEM brings the best performance in all applications. The current SEM always uses an electromagnetic system for the electron lens and for the deflection, and it inherently has an inferiority in several characteristics, such as the magnetizing delay and the hysteresis. If we use the electrostatic system, image acquisition can be very fast and stable, and it will be a light and compact system and consume less electric power. Although the electrostatic SEM has been left behind the race to get higher spatial resolution because of the difficulties in electrical insulation and consume less electric power. Although the electrostatic SEM has been left behind the race to get higher spatial resolution because of the difficulties in electrical insulation and in the production of accurate … More shape of electrodes, it still has interesting features in a limited field, such as at low accelerating voltages. The aim of this research is to develop an electrostatic SEM, and this paper sumarizes several aspects in the development.Aspects concerned are the following : (1) vacuum system, (2) electron optics including the structure of the electron gun and voltages to be applied to every electrode, (3) signal detection using a photo-diode, (4) hard-ware and soft-ware of the scanning system of the electron beam, the signal processing system, the image analyzing system, and the interface to a personal computer, etc. Using the developed system, several electron beam parameters are obtained, and some SEM images are obtained. Since the resolution of the image obtained by the system is not sufficient, new electron optical system is proposed by a numerical calculation. At last, electron scattering phenomena in a specimen are simulated and the SEM signal contrast is theoretically obtained for a prediction of the surface topographic features. Less

扫描电子显微镜（SEM）的主要要求是高放大倍数，最大分辨率可达0.5nm左右。然而，当前类型的SEM并不总是在所有应用中都具有最佳性能。当前的SEM总是使用电磁系统用于电子透镜和偏转，并且其固有地在几个特性（例如磁化延迟和滞后）方面具有劣势。如果我们使用静电系统，图像采集可以是非常快速和稳定的，它将是一个轻和紧凑的系统，消耗较少的电力。虽然静电扫描电镜由于电绝缘困难和耗电少而在获得更高空间分辨率的竞赛中被甩在后面。尽管静电扫描电镜由于电绝缘和精确的生产困难而在获得更高空间分辨率的竞赛中落后了， ...更多信息 尽管电极的形状不同，但在有限的电场中，例如在低加速电压下，它仍然具有有趣的特征。本研究的目的是研制一种静电扫描电镜，本文总结了研制过程中的几个方面，主要涉及以下几个方面：（1）真空系统，（2）电子光学，包括电子枪的结构和施加到每个电极上的电压，（3）使用光电二极管的信号检测，（4）电子束扫描系统的硬件和软件，信号处理系统、图像分析系统和微机接口等。利用研制的系统，获得了电子束参数，并获得了扫描电镜图像。由于该系统获得的图像分辨率不够，通过数值计算提出了新的电子光学系统。最后，模拟了样品中的电子散射现象，并从理论上得到了用于预测表面形貌特征的SEM信号对比度。少

项目成果

菅 博: "指定された電子ビーム軌道を得るための電極系の設計法" Memoirs of the Osaka Institute of Technology Series A. 36. 63-74 (1992)

菅浩：《获得指定电子束轨迹的电极系统的设计方法》大阪工业大学回忆录系列A.36.63-74（1992）

M.Kotera: "Theoretical Evaluation of a Topographic Contrast of Scanning Electron Microscope Images" Proc. 1991 Intn. Micro Process Conf.398-404 (1992)

M.Kotera：“扫描电子显微镜图像形貌对比度的理论评估”Proc。

M.Kotera: "Simulation of Scanning Electron Microscape Image for Trench Structures" Scan. Microsc.32. 6281-6286 (1993)

M.Kotera：“沟槽结构扫描电子显微图像的模拟”扫描。

山口 聡: "走査電子顕微鏡における画像コントラストのシミュレーションII" 日本学術振興会第132委員会. 研究会資料. 183-187 (1991)

Satoshi Yamaguchi：“扫描电子显微镜图像对比度的模拟 II”日本学术振兴会第 132 届委员会材料 183-187（1991）。

小寺 正敏: "静電型走査電子顕微鏡の製作" 大阪工大摂南大学中研所報. 61-87 (1993)

Masatoshi Kodera：“静电扫描电子显微镜的制造”大阪工业大学节南大学中央研究所报告61-87（1993）。