Study on generating a flat for Molecular Beam Epitaxy

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This study has clarified a possibility to apply a Molecular Beam Epitaxy (MBE) to generate a geometrically flat and crystallography aligned surface. The method is often used to prepara new semi-conductive materials, however, the mechanism how a geometric surface for mechanical use is built up by a deposition of molecules is not known. Taking a homo-epitaxial case as an example, silicon molecular beam was deposited onto a single crystallized silicon substrate, and that process investigated by the help of RHEEDS.A newly obtained surface had better crystalline than that of substrates.