Widening of the joined interface by the procedure without heating and pressing

在俄歇电子显微镜超高真空室中建立的粘附力测量系统中，引入了一种新的操纵系统。它有一个加热系统和一个附加的倾斜自由。在粘附力测量过程中，表面结构的重建、表面的光滑以及二次电子显微镜对表面的原位观察。将计算结果与弹性连续体理论进行了比较。用该理论分析和讨论了离子溅射对粘附力的影响和粘接接触的调节机制。K.Takahashi导出了完全接触的表面粗糙度判据。计算结果与T.Suga的实验结果定性一致。预计将进行定量调查。Y.Takahashi从理论和实验上讨论了连接过程中界面扩散的增强效应。清水对离子溅射的损伤进行了讨论。结果表明，离子溅射的作用主要是由于表面形变的增强，而不是表面能的变化。T.Sekine讨论了表面分析的极限。K.Seimiya研究了表面粗糙度的控制。

A manipulating system is newly introduced to our adhesion force measurement system constructed in ultra high vacuum chamber of an Auger electron microscope. It has a heating system and an additive tilt freedom. The reconstruction of surface structure, the smoothing of the surface and the in-situ observation of the surface by secondary electron microscope during the adhesion force measurements. Results are compared with our theory which is deduced assuming the elastic continuum. The effects of the ion sputtering on the adhesion force and the governing mechanism of the adhesional contact are examined and discussed by using the theory. Criterion of surface roughness for perfect contact is deduced by K.Takahashi. The results qualitatively agree with the experimental results by T.Suga. The quantitative investigation is expected. The enhancing effects of interfacial diffusion during the joining is theoretically and experimentally discussed by Y.Takahashi. Damaging by ion sputtering is discussed by R.Shimizu. It is suggested that the effect of ion sputtering is mainly due to enhancement of the surface deformation rather than surface energy change. The limit of surface analysis is discussed by T.Sekine. Controlling of the surface roughness is investigated by K.Seimiya.