Widening of the joined interface by the procedure without heating and pressing

通过不加热、不加压的工序扩大接合界面

• 批准号: 07305058
• 负责人: ONZAWA Tadao
• 金额: $ 4.99万
• 依托单位: Tokyo Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1995
• 资助国家: 日本
• 起止时间: 1995 至 1996
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07305058/
• 关键词: adhesion; atomic force microscope; ultra high vacuum; molecular dynamics; chemical bond; interface; electronic spectroscopy; surface analysis; 無加圧; 接合; 拡散

A manipulating system is newly introduced to our adhesion force measurement system constructed in ultra high vacuum chamber of an Auger electron microscope. It has a heating system and an additive tilt freedom. The reconstruction of surface structure, the smoothing of the surface and the in-situ observation of the surface by secondary electron microscope during the adhesion force measurements. Results are compared with our theory which is deduced assuming the elastic continuum. The effects of the ion sputtering on the adhesion force and the governing mechanism of the adhesional contact are examined and discussed by using the theory. Criterion of surface roughness for perfect contact is deduced by K.Takahashi. The results qualitatively agree with the experimental results by T.Suga. The quantitative investigation is expected. The enhancing effects of interfacial diffusion during the joining is theoretically and experimentally discussed by Y.Takahashi. Damaging by ion sputtering is discussed by R.Shimizu. It is suggested that the effect of ion sputtering is mainly due to enhancement of the surface deformation rather than surface energy change. The limit of surface analysis is discussed by T.Sekine. Controlling of the surface roughness is investigated by K.Seimiya.

介绍了在俄歇电子显微镜超高真空室中建立的附着力测量系统的操作系统。它有一个加热系统和一个附加的倾斜自由。在附着力测量过程中，对表面结构进行重建，对表面进行平滑处理，并利用二次电子显微镜对表面进行原位观察。结果与假设弹性连续体的理论进行了比较。应用理论分析和讨论了离子溅射对黏附力的影响和黏附接触的控制机理。高桥（K.Takahashi）推导了完美接触的表面粗糙度判据。所得结果与T.Suga的实验结果定性一致。预计将进行定量调查。从理论上和实验上讨论了连接过程中界面扩散的增强作用。shimizu对离子溅射损伤进行了讨论。结果表明，离子溅射的影响主要是由于表面变形的增强而不是表面能的变化。T.Sekine讨论了表面分析的局限性。K.Seimiya研究了表面粗糙度的控制。