Development of Stacked Thin-film Micro-actuator with Two Laser Beam

两束激光堆叠式薄膜微执行器的研制

• 批准号: 07405009
• 负责人: IKEDA Masayuki
• 金额: $ 21.63万
• 依托单位: HOKKAIDO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1995
• 资助国家: 日本
• 起止时间: 1995 至 1997
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07405009/
• 关键词: THIN FILM; SHAPE MEMRY ALLOY; BIMETAL; CERAMICS FILM; FERROELECTRICS FILM; FILM ACTUATER; LASER ABRATION; INSULATING THIN FILM; 多層超薄膜形成; 金属多層薄膜形成; 機能性多層薄膜; 複合多層薄膜; セラミックス膜形成; 薄膜マイクロアクチュエータ; 金属多層膜形成; 複合多層膜評価; 機能性多層膜特性

A new ultra-thin multi-layr film forming apparatus combined molecular beam epitaxy and ArF excimer laser abrasion was designed and developed. As an evaporating source, high temperature Knudsen cell was employed to control of depositing rate and constituents precisely. The maximun rising temperature was 1700ﾟC.In order to correct the oxygen content of a metal oxide ceramics film and to treat the surface of a substrate clean an Ion-beam gun was installed. And for heating and activating, CO_2 laser beam was irradiated onto the substrate surface.The metal oxide ceramics such as A1_20_3, PbO,TiO_2, BaTiO_3 films of 4-6 nm thickness were fomed on Si (100) substrates by ArF excimer laser abrasion. It is possible to deposit the extremely thin and fine Al_2O_3 film at room temperature successfully. According to X-ray diffraction analysis, the crystallographic structure of the film formed at room temperature was amorphous, but it changed to gamma structure above 750ﾟC.Surface roughness was less … More 0.72 nm R_y and any hole or micro-defect wasn't found by the AFM observation. This ultra-thin film would be applicable for the film insulator of multi-layr GMR devices, Josephson junction etc. The investigation into applications should be continued. It was found that crystallographic structure of the PbO,TiO_2, BaTiO_3 films were controlled by temperature of the substrate during laser abrasion. The PbO film changed from alpha to beta structure beyond 400ﾟC gradually. The BaTiO_3 film shows the perovskite structure at the temperature between 450 and 550ﾟC,however, Ba decomposes then the film changes rutile type structure TiO_2 at the temperature above 600ﾟC.It was found that the ferroelectrics thin film of BaTiO_3 and TiO_2-PbO multi-layr can be formed by ArF excimer laser abrasion.We formed various thin film of Fe, Ni, Ti, TiNi (shape memory alloy ; SMA). Fe_<65>Ni_<35> (invar alloy : IVA). The minimum depositing rate obtained was less than 0.01 nm/min. Constituents of alloys were controlled better than 1%. We designed a new SMA film actuator which was stacked SMA and bimetal consisting two thin layrs of Fe and IVA.The actuator is possible to recover initial shape by bimetal defoming force. We are investigating the dynamic characteristics and optimum shape or size. Less

设计并研制了一种结合分子束外延和ArF准分子激光研磨的超薄多层膜成膜装置。采用高温努森池作为蒸发源，精确控制沉积速率和成分。最高温升为1700 ℃。为了校正金属氧化物陶瓷膜的氧含量和清洁处理基片表面，安装了离子束枪。采用ArF准分子激光器在Si（100）基片上制备了厚度为4-6 nm的Al_2O_3、PbO、TiO_2、BaTiO_3等金属氧化物陶瓷薄膜。在室温下成功地存款出极薄、极细的Al_2O_3薄膜是可能的。X射线衍射分析表明，室温下形成的薄膜为非晶态结构，而在750 ℃以上转变为γ结构，表面粗糙度较小 ...更多信息 0.72原子力显微镜观察未发现孔洞或微缺陷。这种超薄膜可用于多层巨磁阻器件的薄膜绝缘体、约瑟夫森结等，其应用前景值得继续研究。结果表明，PbO，TiO_2，BaTiO_3薄膜的晶体结构受激光烧蚀过程中衬底温度的控制。400 ℃以后，PbO薄膜逐渐由α结构转变为β结构。BaTiO_3薄膜在450 ~ 550 ℃之间为钙钛矿结构，而在600 ℃以上Ba分解，转变为金红石型TiO_2结构，发现用ArF准分子激光刻蚀可形成BaTiO_3和TiO_2-PbO多层铁电薄膜，并制备了Fe、Ni、Ti、TiNi等多种铁电薄膜（形状记忆合金; SMA）。Fe_<65>Ni_<35>（因瓦合金：IVA）。获得的最小沉积速率小于0.01 nm/min，合金成分控制在1%以下。我们设计了一种新型的SMA薄膜驱动器，该驱动器是由两层薄的Fe和IVA组成的SMA和IVA叠层结构，该驱动器可以通过形变力恢复初始形状。我们正在研究动态特性和最佳形状或尺寸。少

项目成果

池田、森野 ほか: "エキシマレーザアブレーション法で形成したセラミックス超薄膜の特性" 第70回レーザエネルギ応用機器研究会資料. (印刷中). (1998)

Ikeda, Morino 等人：“准分子激光烧蚀形成的超薄陶瓷薄膜的特性”来自第 70 届激光能量应用设备研究组的材料（1998 年出版）。

Kimura, M.Ikeda et al.: "A Study on Laser Welding (the 1^<st>) Measurement of Basic Phenomena in Welding" J.of the Jap.Soc.for Percis.Engg.63-4. 575-579 (1997)

Kimura, M.Ikeda 等人：“焊接中基本现象的激光焊接（第 1^<st>）测量研究”J.of the Jap.Soc.for Percis.Engg.63-4。

田中、池田 ほか: "MBE装置を用いたFe65Ni35インバー合金の組成制御の研究" 精密工学会北海道支部学術講演会論文集. 20-21 (1997)

Tanaka、Ikeda等：“使用MBE设备对Fe65Ni35 invar合金的成分控制进行研究”日本精密工程学会北海道分会学术会议论文集20-21（1997）。

T.Morino, M.Ikeda etal.: "Formation of Al_2O_3 Ultra-thin Film by ArF Excimer Laser Abrasion" Proced.of Hokkaido Area Meeting of JSPE. 16-17 (1997)

T.Morino、M.Ikeda 等：“ArF 准分子激光磨蚀形成 Al_2O_3 超薄膜” JSPE 北海道地区会议论文集。

池田正幸: "「旧くて新しいレーザーの技術課題」" レーザ協会誌. 21巻4号. 1-2 (1996)

Masayuki Ikeda：“‘激光的新旧技术问题’”激光协会杂志，第 21 卷，第 4 期。1-2 (1996)。