Development of Recovery System for VOC Vapors by Ion-Induced Nucleation

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In semiconductor manufacturing process, various kinds of volatile organic solvents are used for cleaning wafer surfaces and the recovery for these solvents from the atmosphere is of great concern. In the present work, we aimed at developing recovery system of CCl_4 vapor with the concentration of ppm level. CCl_4 vapor is ionized by corona discharge and grown to particles by ion-induced nucleation and then removed by electrostatic precipitation. We designed i) sonic jet ionizer, ii) ion-induced nucleation chamber, and iii) electrostatic precipitator, and studied the individual performances as well as the recovery system assembled with these appratuses. As a result, it was shown that i) the sonic jet ionizer is capable of generating high density ions, ii) CCl_4 ions grew to submicron particles by the condensation of water vapor, and iii) the grown particles can be completely removed by the electrostatic precipitator. Further, the recovery system assembled with these apparatuses was found to be effective for the removal of CCl_4 when it exists in air as a single component. Further work is required to elucidate the influence of other coexisting vapors on the removal efficiency of CCl_4.