Development of Simultaneous Removal System for Trace Gaseous and Particulate Contaminants by UV/Photoelectron Method

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This research aims at developing a stocker built-in simultaneous removal system for organic gaseous and particulate contaminants by UV/photoelectron method under both normal and reduced pressures. In the first year, we conducted experiments on removal of gaseous and particulate matter under atmospheric pressure, and then obtained the result that the removal device has steadily high removal efficiency for them. In the second year, we modified the setup so that it can operate under subatmospheric pressure (until 20 torr) and performed experiments similar to the normal pressure conditions. As a result, it was shown that i) particle removal efficiency increased rapidly under 100 torr, ii) the numerical calculation of convective-diffusive equation for particles accounting for their charging efficiency can estimate their removal efficiency at each pressure, iii) the emission of UV/photoelectrons can suppress increase in contact angle of droplets on wafer set in the stocker, which is an index of its organic contamination, iv) the simultaneous usage of UV/photoelectron emitter and UV-irradiated titania can achieve extremely high efficiency for gaseous contaminants at both normal and reduced pressures.