Design and Synthesis of Soluble Network Polysilane and the New Process of SiC Formation
Design and Synthesis of Soluble Network Polysilane and the New Process of SiC Formation
批准号:
07555290
负责人:
WATANABE Akira
金额:
$0.51万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1996
中文摘要
网状聚硅烷具有二维硅网络结构和有机侧链,兼具有机和无机材料的性质。由于硅网络结构,网络聚硅烷具有高稳定性。有机侧链赋予网状聚硅烷溶解性。本工作中,我们进行了具有各种硅骨架和有机侧链的网状聚硅烷的分子设计和合成。研究了热处理过程中网状聚硅烷光电性能的变化。讨论了热处理过程中硅骨架对聚硅烷光电性能的影响,并比较了网状聚硅烷和线型聚硅烷的吸收光谱和发射光谱。网络聚硅烷的光学带隙比线性聚硅烷的光学带隙小,表明网络聚硅烷具有二维硅骨架。在这种 关于我们 热分析表明,网状聚硅烷比线型聚硅烷具有更高的热稳定性。在1000 ℃热处理下,聚苯基硅炔的失重率小于30%,聚苯基硅炔的旋涂薄膜经一步热处理后得到了SiC薄膜。SiC薄膜的XPS谱表明碳含量高于硅含量。为了降低聚硅烷的碳含量,合成了具有不同有机侧链的网状聚硅烷。聚(正丙基硅炔)的热处理显示出最低的碳含量,由于丙基基团的消除。聚硅烷的合成已通过使用熔融的钠金属在热甲苯中的Kipping反应进行。反应条件苛刻是制约其工业化应用的难题之一。本文提出了一种利用镁电极电解三氯有机硅烷合成三氯有机硅烷的新方法。作为无机薄膜的前驱体,合成了含有硅烯和芳香族单元的新型有机金属聚合物。少
英文摘要
The network polysilane has a two-dimensional silicon network structure and organic side chains, which shows both properties of organic and inorganic materials. The network polysilane has high stability due to the silicon network structure. The organic side chain gives the solubility to the network polysilane. In this work, we carried out the molecular design and the synthesis of the network polysilanes which have various kinds of silicon skeletons and organic side chains. The change of the optical and electrical properties of the network polysilanes was investigated during the heat treatment. The effects of the silicon skeleton on ttheoptical and electrical properties by the heat treatment were discussed.The absorption and emission spectra of a network polysilane were compared with those of a linear polysilane. The optical band gap of the network polysilane was lower than that of the linear polysilane, which suggests the two-dimensional silicon skeleton of the networl polysilane. In th … More e thermal analysis, the network polyilane showed the higher thermal stability compared to the linear polysilane. The weight loss of the poly (phenylsilyne) is lower than 30% by the heat treatment at 1000oC.The spin-coated film of the poly (phenylsilyne) gave a SiC thin film by the heat treatment in one-step. The XPS spectra of the SiC film indicated the carbon content higher than the silicon content. To decrease the carbon content, network polysilane with various organic side chains were synthesized. The heat treatment of the poly (n-propylsilyne) showed lowest carbon content due to the elimination of the propyl group. The synthesis of polysilanes has been carried out by the Kipping reaction using a fused sodium metal in a hot toluene. The hard reaction condition was one of the problems for the industrial application. A new synthetic route by the electorolysis of a trichloroorganosilane using a magnesium electrode was developed. As a precursor for inorganic films, new organometatic polymers having silylene and aromatic units were synthesized. Less
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A.Watanabe: "SiC/SiO_2 Micropatterning by Ultraviolet Irradiation and Heat-Treatment of a Poly(phenylsilyne)" J.Appl.Phys. 77. 2796-2800 (1995)
A.Watanabe:“通过紫外线照射和聚(苯基硅炔)热处理进行 SiC/SiO_2 微图案化”J.Appl.Phys。
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渡辺 明: "有機ケイ素ポリマーの最新技術" ケイ素材料を用いるマイクロパタ-ニング, 23 (1996)
Akira Watanabe:“有机硅聚合物的最新技术”使用硅材料的微图案化,23(1996)
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M-.C.Fan: "Time-resolved Emission Anisotropic Studies of Silylene-Diphenylene Copolymers. Energy migration along the σ-π Conjugated Chain" Chem. Lett.417-418 (1996)
M-.C.Fan:“硅烯-二亚苯基共聚物的时间分辨发射各向异性研究。沿 σ-π 共轭链的能量迁移”Chem.417-418 (1996)
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A.Watanabe: "Micropattern of Inorganic Film Prepared by UV-Irradiation and Heat-Treatment of Polyalkylsilyne Film" Jpn.J.Appl.Phys.34. L452-L454 (1995)
A.Watanabe:“通过聚烷基硅炔薄膜的紫外线照射和热处理制备的无机薄膜的微图案”Jpn.J.Appl.Phys.34。
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A.Watanabe, Y.Nagai, and M,Matsuda: "Micropattern of Inorganic Film Prepared by UV-Irradiation and Heat-Tretment of Polyalkylsilyne Film" Jpn.J.Appl.Phys.34. L452-L454 (1995)
A.Watanabe、Y.Nagai 和 M,Matsuda:“通过聚烷基硅炔薄膜的紫外线照射和热处理制备无机薄膜的微图案”Jpn.J.Appl.Phys.34。
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