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Formation of Functionally Gradient cBN Films Using Ion Beam

Formation of Functionally Gradient cBN Films Using Ion Beam
使用离子束形成功能梯度 cBN 薄膜
批准号:
07555521
负责人:
MIYAKE Shoji
金额:
$1.41万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1996

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中文摘要
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英文摘要
Boron nitride films were prepared by IBAD with N and/or Ar-mixtured ions. The c-BN films with improved tribological properties has been approached by inserting a B-rich buffer layr as a controlled buffer at the interface. Tribological characterization of the buffer layr indicated that the films with higher B/N transport ratio exhibited the simultaneous achievement of the highest adhesion strength tigether with the highest hardness value. The stoicheometric upper layr with high fraction of c-BN phase could be successfully grown on the B-rich layr formed on various substrates including highspeed-tool steel and WC.The insertion of the buffer layr exhibited the significant effect on the reduction of internal stress of the c-BN films and further on the enhancement of the tribological properties to obtain high hardness simultaneously with high adhesion strength. The double-layred BN films exhibited excellent characteristics in anti-corrosion capability, high-temperature phase stability and chemical innertness against various glass at elevated temperatures.
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T.Suzuki,Y.Tanaka,Y.Setsuhara,S.Miyake M.Suzuki and M.Kumagai: "Studies on Buffer Layer for Practical Properties of c-BN Films by IBAD" Proc.4th Int.Symp.on Advanced Mat.(ISAM'97). 141-146 (1997)
T.Suzuki、Y.Tanaka、Y.Setsuhara、S.Miyake M.Suzuki 和 M.Kumagai:“IBAD 对 c-BN 薄膜实用性能的缓冲层的研究”Proc.4th Int.Symp.on Advanced Mat。
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Y.Setsuhara, T.Suzuki, Y.Tanaka, and S.Miyake: "Formation of c-BN films with enhanced tribological properties by IBAD" Proc.Int.Symp.on Microwave, Plasma and Thermochemical Processing of Advanced Materials.
Y.Setsuhara、T.Suzuki、Y.Tanaka 和 S.Miyake:“通过 IBAD 形成具有增强摩擦学性能的 c-BN 薄膜”Proc.Int.Symp.on 微波、等离子体和先进材料的热化学加工。
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Development of sintering and joining processes of high performance ceramics for next generation by using high power millimeter-wave radiation
  • 批准号:
    10555249
  • 项目类别:
    Grant-in-Aid for Scientific Research (B).
  • 资助金额:
    $8.26万
  • 财政年份:
    1998
  • 负责人:
    MIYAKE Shoji
  • 依托单位:
Preparation of Super-Hard Nitride Thin Films for Next Generation by High Density Plasma PVD
  • 批准号:
    09480091
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 资助金额:
    $3.26万
  • 财政年份:
    1997
  • 负责人:
    MIYAKE Shoji
  • 依托单位:
Functional Materials Processing by Electromagnetic Heating
  • 批准号:
    07045027
  • 项目类别:
    Grant-in-Aid for international Scientific Research
  • 资助金额:
    $2.82万
  • 财政年份:
    1995
  • 负责人:
    MIYAKE Shoji
  • 依托单位:
Study on Functional Surface Modification by Ion Dynamic Mixing Method
  • 批准号:
    03452263
  • 项目类别:
    Grant-in-Aid for General Scientific Research (B)
  • 资助金额:
    $4.42万
  • 财政年份:
    1991
  • 负责人:
    MIYAKE Shoji
  • 依托单位:
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