Synthesis and Reliability Evaluation of Environmental Coating Films by Ion-Beam-Assisted Deposition

离子束辅助沉积环保涂膜的合成及可靠性评价

• 批准号: 14550085
• 负责人: UCHIDA Hitoshi
• 金额: $ 2.43万
• 依托单位: University of Hyogo (2004)Himeji Institute of Technology (2002-2003)
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2002
• 资助国家: 日本
• 起止时间: 2002 至 2004
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-14550085/
• 关键词: Titanium aluminum nitride; Ion mixing vapor deposition; Phase transition; Hard coating; Pinhole defect; Anodic polarization; Oxidation resistance; 分極曲線; 分極極線

Recently, studies on the synthesis of (Ti,Al)N films have attracted interests, in particular as an alternative to the widely used TiN films, to obtain wear-protective hard coating with higher oxidation resistance at elevated temperature. Thus far, investigations into (Ti,Al)N film preparation have been performed using a variety of physical and chemical deposition techniques. In this study, the (Ti,Al)N films were prepared by depositing Ti and Al metal vapor under simultaneous irradiation of N ions, that is ion mixing and vapor deposition(IVD) technique.All (Ti,Al)N films prepared under various conditions were of satisfactory quality with smooth surface though they contained more or less pinhole defects. They exhibited the columnar structure with grainy appearance, which changed to dense structure with an increase of evaporation and/or transport ratio. In this case, the single-phase of NaCl structure in the films transformed into that of wurtzite structure through the two-phase mixture consisting of NaCl and wurtzite structure. The (Ti,Al)N films with two-phase structure indicate superior hardness for hard coating. The unsuitable pinhole defects for corrosion-resistive applications are hardly influenced by the transport and/or evaporation ratios. The (Ti,Al)N films were highly resistant against oxidation, because the protective layers of Al oxides were formed on the top of the films at elevated temperature in air.

近年来，（Ti，Al）N薄膜的合成研究引起了人们的兴趣，特别是作为广泛使用的TiN薄膜的替代物，以获得在高温下具有更高抗氧化性的耐磨硬质涂层。到目前为止，研究（Ti，Al）N薄膜的制备已经进行了各种物理和化学沉积技术。本研究采用离子混合气相沉积（IVD）技术，在N离子同时辐照下，用Ti和Al金属蒸气沉积法制备了（Ti，Al）N薄膜，在不同条件下制备的（Ti，Al）N薄膜表面光滑，但存在不同程度的针孔缺陷。它们呈现出颗粒状的柱状结构，随着蒸发和/或传输率的增加，其转变为致密结构。在这种情况下，在薄膜中的NaCl结构的单相转化为纤锌矿结构的，通过由NaCl和纤锌矿结构的两相混合物。（Ti，Al）N薄膜具有两相结构，具有上级硬度。不适合耐腐蚀应用的针孔缺陷几乎不受传输和/或蒸发率的影响。由于在空气中高温下，（Ti，Al）N薄膜表面形成了Al氧化物保护层，因此（Ti，Al）N薄膜具有良好的抗氧化性能。

项目成果

Characterization of (Ti,Al)N Films Prepared by Io Mixing and Vapor Deposition

Io混合和气相沉积制备(Ti,Al)N薄膜的表征

• 发表时间: 2004
• 期刊: Materials Science and Engineering, A 387-389
• 作者: H.Uchida;M.Yamashita;S.Hanaki;T.Ueta
• 通讯作者: T.Ueta

Preparation and Characterization of (Ti,Al)N Films by Ion mixing and Vapor Deposition Technique

离子混合和气相沉积技术制备(Ti,Al)N薄膜并表征

• 发表时间: 2005
• 期刊: Journal of The Society of Materials Science, Japan 54(in press)
• 作者: H.Uchida;M.Yamashita;S.Hanaki;T.Ueta
• 通讯作者: T.Ueta

Corrosion and Oxidation Resistance of (Ti,Al)N films prepared by ion mixing and vapor deposition

离子混合气相沉积(Ti,Al)N薄膜的耐腐蚀性和抗氧化性

• 发表时间: 2004
• 期刊: Proc.Int.Conf.on New Frontiers of Process Science and Engineering in Advance Materials
• 作者: T.Fujimoto;S.Hanaki;M.Yamashita;H.Uchida
• 通讯作者: H.Uchida

イオンミキシング蒸看法による(Ti,Al)N薄膜の作製とその特性評価

离子混合气化法制备(Ti,Al)N薄膜及其性能评价

• 发表时间: 2003
• 期刊: 材料 54巻10号(印刷中)
• 作者: 内田 仁;山下正人;花木 聡;植田壮映
• 通讯作者: 植田壮映

植田壮映, 花木 聡, 山下正人, 内田 仁: "イオンビーム援用(Ti,Al)N薄膜の作製と特性評価"(社)腐食防食協会 第50回材料と環境討論会講演集. 79-82 (2003)

Soei Ueda、Satoshi Hanaki、Masato Yamashita、Hitoshi Uchida：“离子束辅助 (Ti,Al)N 薄膜的制备和表征”第 50 届腐蚀预防协会材料与环境研讨会论文集 (2003)。