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Development of a Large-Diameter Thermal Plasma Processing Device and its Application to Synthesis of Thermoelectric Materials

Development of a Large-Diameter Thermal Plasma Processing Device and its Application to Synthesis of Thermoelectric Materials
大直径热等离子体加工装置的研制及其在热电材料合成中的应用
批准号:
07558066
负责人:
FUKUMASA Osamu
金额:
$4.29万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1996

项目摘要

项目成果

FUKUMASA Osamu的其他基金

相关文献

中文摘要
翻译
减压热等离子体射流具有速度快、气体温度高、等离子体体积大等优点,在合成新材料方面具有很大潜力。为此,我们重新设计了由强制紧缩式等离子体射流发生器和进料环组成的等离子体反应器。为了阐明该反应器在材料精细等离子体加工中的应用可行性,对等离子体射流的行为进行了研究,主要结果如下:(1)在低压下,等离子体射流的高温区和高速区被扩大。(2)在低压下,梯度功能材料的硬度和结合强度都很高。(3)在常压和低压下,以α-Al_2O_3、Na_2CO_3和MgO为原料,成功地合成了β“-氧化铝薄膜。β”-氧化铝的合成取决于射流功率和进给环出口到衬底的距离。CH4流量与H2流量之比低于某一临界值。也就是说,衬底附近的CH/H<α>的强度对纯金刚石薄膜的沉积有很大的影响。(5)计算机层析成像技术应适用于非对称等离子体射流的诊断。
英文摘要
Thermal plasma jet operated under reduced pressure has a great potential for synthesizing new materials, because of its high speed, high gas temperature and large plasma volume. Therefore, we have newly designed the plasma reactor composed of the forced constricted type plasma jet generator and the feed ring. In order to clarify the application feasibility of this reactor to fine plasma processing for materials, the behavior of the plasma jet has been discussed.Findings are as follows :(1) Under low pressure, high temperature and high velocity regions of the plasma jet are expanded. With the use of this expanding plasma jet, the dense film without vesicles is obtained and the film thickness is easily controlled.(2) Under low pressure, the hardness and the adhesion strength of functionally gradient materials are found to be high.(3) Under not only atmospheric pressure but also low pressure, thin-films of beta" -alumina are successfully synthesized from the powder mixtures, i.e.alpha-Al_2O_3, Na_2CO_3 and MgO.Synthesis of beta" -alumina depends on jet power and the distance from the feed ring exit to the substrate.(4) When pure diamond films are synthesized, the ratio of CH_4 flow rate to H_2 flow rate is lower than a certain critical value. Namely, the intensity of CH/H_<alpha> in the vicinity on the substrate has strong effect on pure diamond film deposition.(5) The computer tomography technique should be applicable to the diagnostics of asymmetric plasma jets.
期刊论文(14)
专著(0)
科研奖励(0)
会议论文
Satoshi Sakiyama: "Fabrication of Functionally Gradient Materials by Plasma Spraying" Proc.13th Symp.Plasma Processing. Vol.13. 263-266 (1996)
Satoshi Sakiyama:“通过等离子喷涂制备功能梯度材料”Proc.13th Symp.Plasma Process。
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通讯作者:
福政 修 他: "熱プラズマ材料プロセシング基礎と応用" (株)信山社サイテック, 351 (1996)
Osamu Fukumasa 等:“热等离子体材料加工基础知识和应用” Shinzansha Cytech Co., Ltd.,351 (1996)
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通讯作者:
福政 修: "直流熱プラズマとその材料プロセスへの応用" プラズマ・核融合学会誌. 72. 236-242 (1996)
Osamu Fukumasa:“直流热等离子体及其在材料加工中的应用”日本等离子体与核聚变学会杂志 72. 236-242 (1996)。
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通讯作者:
Osamu Fukumasa: "DC Thermal Plasma and their Application to Plasma Processing for Materials" Journal of Plasma and Fusion Research. Vol.72. 236-242 (1996)
Osamu Fukumasa:“直流热等离子体及其在材料等离子体加工中的应用”等离子体与聚变研究杂志。
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共 12 条
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