Elucidation of molecular processes in negative ion volume production with measuring VUV emissions in RF discharge D_2 plasmas
Elucidation of molecular processes in negative ion volume production with measuring VUV emissions in RF discharge D_2 plasmas
批准号:
14208049
负责人:
FUKUMASA Osamu
金额:
$28.62万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2002
资助国家:
日本
项目状态:
已结题
起止时间:
2002 至 2004
中文摘要
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英文摘要
In the design of a neutral beam injection (NBI) system for future large fusion devices such as the ITER, sources of H^- or D^- negative ions are required for generation of efficient neutral beams with energies 1 MeV. Long life time ion sources are also required for the future NBI systems. Microwave discharge plasmas and RF discharge plasmas are promising as long life time ion sources. Here, production and control of D_2 RF discharge plasmas, enhancement of D^- ions production and isotope effect of H^-/D^- production are studied. Findings are summaried as the following five items :1.With magnetic filter method, production and control of DC discharge D_2 plasmas are discussed for enhancement of D^- volume production.2.For enhancement of volume negative ion production, effect of Argon addition into H_2 and D_2 plasmas are discussed with measuring plasma parameters and VUV emissions.3.For H^-/D^- negative ion production, production and control of RF discharge plasmas are studied with grid bias method.4.Grid bias method and magnetic filter method for controlling plasma parameters are discussed for negative ions productions.5.Modeling of negative ion sources.(1)Extraction probability of negative ions in cesium seeded hydrogen plasmas.(2)Relationship between behaviors of primary fast electrons and ionization collisions and excitation collisions of vibrational hydrogen molecules.
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K.Fujioka: "Development of ECR negative ion sources - effects of argon addition of ECR plasmas -"IEEE The 30th International Conference on Plasma Science. 211 (2003)
K.Fujioka:“ECR负离子源的发展-ECR等离子体中氩气添加的影响-”IEEE第30届国际等离子体科学会议。
DOI:
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发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
High-Density ECR Plasma Production with Argon Addition for Negative Ion Sources
添加氩气用于负离子源的高密度 ECR 等离子体生产
DOI:
--
发表时间:
2004
期刊:
7th Asia Pacific Conference on Plasma Science and Technology & 17th Symposium on Plasma Science for Materials
影响因子:
--
作者:
[R.Araya, K.Tani, T.Takagi, N.Yamaguchi, M.Nasu, Y.Satoh et al., T.Sakai]
通讯作者:
T.Sakai
Extraction Probability of Negative Ions from Hydrogen Ion Sources -Effect of Filter Magnetic Field and Gas Pressure-
氢离子源负离子的提取概率-过滤器磁场和气压的影响-
DOI:
--
发表时间:
2004
期刊:
10th International Symposium on Production and Neutralization of Negative Ions and Beams (CD-ROM)
影响因子:
--
作者:
[K.Tani, M.Muneta, K.Nkamura, K.Sibuya., M.Nasu, O.Fukumasa]
通讯作者:
O.Fukumasa
Negative ion density distribution in a volume negative ion source-its dependence on plasma parameters
体积负离子源中的负离子密度分布-其对等离子体参数的依赖性
DOI:
10.1109/plasma.2003.1228694
发表时间:
2003
期刊:
影响因子:
--
作者:
[S. Mori, Y. Tauchi, O. Fukumasa, M. Hamabe, Y. Takeiri]
通讯作者:
Y. Takeiri
Isotope Effect of H–/D– Volume Production in Low‐Pressure H2/D2 Plasmas – Measurement of VUV Emissions and Negative Ion Densities
低压 H2/D2 等离子体中 H–/D– 批量生产的同位素效应 – VUV 发射和负离子密度的测量
DOI:
10.1002/ctpp.200410073
发表时间:
2004
期刊:
Contributions to Plasma Physics
影响因子:
1.6
作者:
[O. Fukumasa, S. Mori, N. Nakada, Y. Tauchi, M. Hamabe, K. Tsumori, Y. Takeiri]
通讯作者:
Y. Takeiri
共 36 条
Fine coatings of bio-seramics with using well controlled thermal plasmas
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批准号:17204053
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$31.12万
-
财政年份:2005
-
负责人:FUKUMASA Osamu
-
依托单位:
Rapid synthesis of magnetic ceramics powders from powder mixtures by using well-controlled thermal plasmas
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批准号:11792027
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项目类别:Grant-in-Aid for University and Society Collaboration
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资助金额:$4.67万
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财政年份:1999
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负责人:FUKUMASA Osamu
-
依托单位:
Elucidation of electron transport control by using the magnetic filter and enhancement of HィイD1-ィエD1DィイD1-ィエD1 production in high frequency negative ion source
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批准号:09480093
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$5.82万
-
财政年份:1997
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负责人:FUKUMASA Osamu
-
依托单位:
Development of a Large-Diameter Thermal Plasma Processing Device and its Application to Synthesis of Thermoelectric Materials
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批准号:07558066
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.29万
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财政年份:1995
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负责人:FUKUMASA Osamu
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依托单位:
Cesium Effects on Enhancing Negative Ion Production in and Negative Ion Extraction from the Hybrid Type Negative Ion Sources
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批准号:06452424
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.1万
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财政年份:1994
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负责人:FUKUMASA Osamu
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依托单位:
Research and Development of a High Current Deuterium Negative Ion Source
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批准号:02452277
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$3.65万
-
财政年份:1990
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负责人:FUKUMASA Osamu
-
依托单位:
海外基金