Elucidation of molecular processes in negative ion volume production with measuring VUV emissions in RF discharge D_2 plasmas

通过测量 RF 放电 D_2 等离子体中的 VUV 发射来阐明负离子量产生的分子过程

• 批准号: 14208049
• 负责人: FUKUMASA Osamu
• 金额: $ 28.62万
• 依托单位: Yamaguchi University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 2002
• 资助国家: 日本
• 起止时间: 2002 至 2004
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-14208049/
• 关键词: negative ion source for NBI; volume production; surface production; VUV emission; isotope effect of H^-; D^- production; RE plasma; mesh grid negatively biasing; magnetic filter; レーザ光脱離法

In the design of a neutral beam injection (NBI) system for future large fusion devices such as the ITER, sources of H^- or D^- negative ions are required for generation of efficient neutral beams with energies 1 MeV. Long life time ion sources are also required for the future NBI systems. Microwave discharge plasmas and RF discharge plasmas are promising as long life time ion sources. Here, production and control of D_2 RF discharge plasmas, enhancement of D^- ions production and isotope effect of H^-/D^- production are studied. Findings are summaried as the following five items :1.With magnetic filter method, production and control of DC discharge D_2 plasmas are discussed for enhancement of D^- volume production.2.For enhancement of volume negative ion production, effect of Argon addition into H_2 and D_2 plasmas are discussed with measuring plasma parameters and VUV emissions.3.For H^-/D^- negative ion production, production and control of RF discharge plasmas are studied with grid bias method.4.Grid bias method and magnetic filter method for controlling plasma parameters are discussed for negative ions productions.5.Modeling of negative ion sources.(1)Extraction probability of negative ions in cesium seeded hydrogen plasmas.(2)Relationship between behaviors of primary fast electrons and ionization collisions and excitation collisions of vibrational hydrogen molecules.

在为未来大型核聚变装置（如ITER）设计中性束注入（NBI）系统时，需要H^-或D^-负离子源来产生能量为1 MeV的高效中性束。未来的NBI系统还需要长寿命的离子源。微波放电等离子体和射频放电等离子体是很有前途的长寿命离子源。本文研究了D_2射频放电等离子体的产生和控制、D^-离子产生的增强以及H^-/D^-产生的同位素效应。调查结果总结为以下五个项目：用磁滤波法讨论了直流放电等离子体的产生和控制，以提高D^-体积产量。通过测量等离子体参数和紫外辐射，讨论了在H_2和D_2等离子体中加入氩气对体积负离子产生的影响。对于H^-/D^-负离子的产生，采用栅格偏置法研究了射频放电等离子体的产生和控制。讨论了栅极偏置法和磁滤波法控制等离子体参数产生负离子的方法。负离子源的建模。(1)铯种子氢等离子体中负离子的提取概率。(2)初级快电子行为与振动氢分子电离碰撞和激发碰撞的关系。

项目成果

K.Fujioka: "Development of ECR negative ion sources - effects of argon addition of ECR plasmas -"IEEE The 30th International Conference on Plasma Science. 211 (2003)

K.Fujioka：“ECR负离子源的发展-ECR等离子体中氩气添加的影响-”IEEE第30届国际等离子体科学会议。

High-Density ECR Plasma Production with Argon Addition for Negative Ion Sources

添加氩气用于负离子源的高密度 ECR 等离子体生产

• 发表时间: 2004
• 期刊: 7th Asia Pacific Conference on Plasma Science and Technology & 17th Symposium on Plasma Science for Materials
• 作者: R.Araya;K.Tani;T.Takagi;N.Yamaguchi;M.Nasu;Y.Satoh et al.;T.Sakai
• 通讯作者: T.Sakai

Extraction Probability of Negative Ions from Hydrogen Ion Sources -Effect of Filter Magnetic Field and Gas Pressure-

氢离子源负离子的提取概率-过滤器磁场和气压的影响-

• 发表时间: 2004
• 期刊: 10th International Symposium on Production and Neutralization of Negative Ions and Beams (CD-ROM)
• 作者: K.Tani;M.Muneta;K.Nkamura;K.Sibuya.;M.Nasu;O.Fukumasa
• 通讯作者: O.Fukumasa

Negative ion density distribution in a volume negative ion source-its dependence on plasma parameters

体积负离子源中的负离子密度分布-其对等离子体参数的依赖性

• DOI: 10.1109/plasma.2003.1228694
• 发表时间: 2003
• 作者: S. Mori;Y. Tauchi;O. Fukumasa;M. Hamabe;Y. Takeiri
• 通讯作者: Y. Takeiri

Isotope Effect of H–/D– Volume Production in Low‐Pressure H2/D2 Plasmas – Measurement of VUV Emissions and Negative Ion Densities

低压 H2/D2 等离子体中 H–/D– 批量生产的同位素效应 – VUV 发射和负离子密度的测量

• DOI: 10.1002/ctpp.200410073
• 发表时间: 2004
• 期刊: Contributions to Plasma Physics
• 影响因子: 1.6
• 作者: O. Fukumasa;S. Mori;N. Nakada;Y. Tauchi;M. Hamabe;K. Tsumori;Y. Takeiri
• 通讯作者: Y. Takeiri