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Study on Preparation Method of Ultra-High-Density Magnetic Recording Media by Sputtering Using Electron Cyclotron Resonance Microwave Plasma

电子回旋共振微波等离子体溅射制备超高密度磁记录介质方法的研究

基本信息

批准号：
07650398
负责人：
YAMAMOTO Setsuo
金额：
$ 1.34万
依托单位：
Yamaguchi University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
1995
资助国家：
日本
起止时间：
1995 至 1996
项目状态：
已结题

项目摘要

To achieve ultra-high density magnetic recording, It is required that recording media have magnetic microstructure which consists of nano-meter size ferro-magnetic regions and non-magnetic regions. The purpose of this research is to establish the Co-Cr media preparation method for ultra-high density magnetic recording. In this research, a new sputtering method using electron cyclotron resonance microwave plasma (ECR sputtering) was introduced which is more suitable to control a plasma precisely than the conventional diode sputtering method.Ar ions in plasma accelerated by the voltage difference between a plasma and a substrate voltage bombared the substrate during film deposition, and make drastic influence on a creation of magnetic microstructure. Ion accelerating voltage of 20V which is a relatively low value is obtained at high Ar pocess gas pressure of 8*10^<-2>Pa and long target-to-substrate distance of 230mm. The Co-Cr media fabricated in the above mentioned sputtering condition showed good crystal orientation, high perpendicular coercivity over 1400Oe and large perpendicular magnetic anisotropy field exceeding 4kOe.To control the ion accelerating voltage in wide range, the magnetic field distribution in a deposition chamber was changed using an auxiliary coil installed near the substrate holder. At cusp magnetic field, ion accelerating voltage was decreased to 11V.The compositional separation with nano-meter size in grains which was achieved in the Co-Cr films deposited at ion accerralating voltage of 11V.From the measurement of recording characteristics, it was proved that the Co-Cr media showed ultra-high density recording resolution and low noise characteristics.

为了实现超高密度磁记录，要求记录介质具有由纳米尺度的铁磁区和非磁区组成的磁性微结构。本研究的目的是建立一种适用于超高密度磁记录的Co-Cr介质制备方法。本文介绍了一种新的电子回旋共振微波等离子体（ECR）溅射方法，该方法比传统的二极管溅射方法更适合于精确控制等离子体，在薄膜沉积过程中，等离子体中的Ar离子被等离子体和衬底电压之间的电压差加速，轰击衬底，对磁性微结构的形成产生显著影响。在8 × 10 ~（-3）Pa的高Ar工艺气压和230 mm的长靶基距下，获得了较低的离子加速电压20 V<-2>。在上述溅射条件下制备的Co-Cr介质具有良好的晶体取向性、超过1400 Oe的高垂直磁化率和超过4 kOe的大垂直磁各向异性场。在尖形磁场下，离子加速电压降低到11 V，在11 V的离子加速电压下沉积的Co-Cr薄膜在晶粒内实现了纳米级的成分分离。记录特性测试表明，Co-Cr介质具有超高密度记录分辨率和低噪声特性。