INVESTIGATION OF ELECTRON BEAM ANALYZER FOR OBSERVING THE SPECIMEN IN THE AIR

空气中标本观测电子束分析仪的研究

• 批准号: 07805008
• 负责人: SUGA Hiroshi
• 金额: $ 0.32万
• 依托单位: OSAKA INSTITUTE OF TECHNOLOGY (OIT)
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1995
• 资助国家: 日本
• 起止时间: 1995 至 1996
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07805008/
• 关键词: electron beam analyzer; Oligo-scattering electron beam; ESEM; Oligo-scattering phenomenon; Monte Carlo simulation; single scattering model; Origo Scatlering; Oligo Scattering; ASEM; AIRSEM; 電子ビーム分析; 試料分析; 検体

This project is concerned with the development of electron beam analyzer for obsevcing the specimen in the air by using Oligo-scattering electron beam which is using for ESEM.The Oligo-scattering phenomenon in the Be or C foil and air is studied by the theoretical analysis and digital simulation. And the conditions which should be considered in design of the device is reauested.First of all, the requirement to take out Oligo scattering electron beam into air through the Be foil is theoretically derived. Next, the simulation program developed to analyze Oligo-scattering phenomenon is described. This program is based on the Monte Carlo simulation by which the single scattering model is adopted and it is the one with a wide range of application to give the result which is corresponding to analysis and the experimental result well so far.It is shown to be able to calculate the behavior of the electron in the Be or C foil and the air layr (or, substituted gas layr) and to use Oligo-scattering beam within the range of the size which can be achieved by the simulation program. And it is confirmed that Oligo-scattering beam reached the specimen surface by passing the foil and the air layr, and generated back scattering elecrons which can be used for image processing in the model size proposed here. According to the calcuation, several nm spot diameter on the specimen surface could be obtained and the reflection rate of electrons could be 7% forE=40keV,L (Be) =0.2mum and L (Air) =200mum.

本课题是研制用于环境扫描电子显微镜（ESEM）的低场散射电子束在空气中观察样品的电子束分析仪。首先，从理论上推导出Oligo散射电子束通过Be箔引出到空气中的条件。接着，描述了为分析寡散射现象而开发的模拟程序。该程序基于蒙特卡罗模拟，采用单次散射模型，是迄今为止应用范围较广的程序，其结果与分析和实验结果吻合较好，能够计算Be或C箔和空气层中电子的行为。（或替代气体层），并在模拟程序所能达到的尺寸范围内使用寡散射光束。并证实了在本文提出的模型尺寸下，寡散射光束通过薄膜和空气层到达样品表面，产生可用于图像处理的后向散射电子。根据计算，当E = 40 keV，L（Be）= 0.2 μ m，L（Air）= 200 μ m时，可在样品表面获得几个nm的光斑直径，电子的反射率可达7%。

项目成果

H.Kumano,Z.Gang,M.kotera,H.Suga: "空気中試料観測用電子顕微鏡の実現可能性" Memoirs of the Osaka Institute of Technology Series. A40.1. 39-47 (1995)

H.Kumano、Z.Gang、M.kotera、H.Suga：“观察空气中样品的电子显微镜的可行性”大阪工业大学回忆录 A40.1 (1995)。

T.Kijima,M.kotera,H.Suga,Y.nakase: "Monte Carlo Calculations on the Passage of Electrons through" Thin Films Irradiated by 300ke V Electrons IEICE Transaction of Electronics. E78-C. 557-563 (1995)

T.Kijima、M.kotera、H.Suga、Y.nakase：“电子通过 300ke V 电子照射薄膜的蒙特卡罗计算”IEICE Transaction of Electronics。

T.Kijima,M.kotera,H.Suga,Y.nakase: "Monte Carlo Calculations on the Passage of Electrons through" Thin Films Irradiated by 300keV Electrons IEICE Transaction on Electronics. E78-C. 557-563 (1995)

T.Kijima、M.kotera、H.Suga、Y.nakase：“电子通过 300keV 电子辐照薄膜的蒙特卡罗计算”IEICE Transaction on Electronics。

T.Kijima, M.Kotera, H.Suga, Y.nakase: "Monte Carlo Calculations on the Passage of Electrons through" Thin Films Irradiated by 300keV Electrons IEICE Transaction on Electronics. E78-C. 557-563 (1995)

T.Kijima、M.Kotera、H.Suga、Y.nakase：“电子通过 300keV 电子辐照薄膜的蒙特卡罗计算”IEICE Transaction on Electronics。

Z.Gang, H.Kumano, M.Kotera, H.Suga: "Application of Oligo-Scattering Beam to Electron Beam Analyzer for Observing the Specimen in the Air" IEICE Transaction. (accepted). (1997)

Z.Gang、H.Kumano、M.Kotera、H.Suga：“寡散射束在电子束分析仪中用于观察空气中样本的应用”IEICE 交易。