课题基金 / 基金详情

Growth of Dislocation-Free Single Crystal Silicon Sheet

Growth of Dislocation-Free Single Crystal Silicon Sheet
无位错单晶硅片的生长
批准号:
08455076
负责人:
YASUTAKE Kiyoshi
金额:
$1.73万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1996
资助国家:
日本
项目状态:
已结题
起止时间:
1996 至 1998

项目摘要

项目成果

YASUTAKE Kiyoshi的其他基金

相似基金

相关文献

中文摘要
翻译
点击翻译按钮获取中文摘要
英文摘要
The aim of this study is to develop a growth method of dislocation-free single crystal Si sheet. Basically, a method of liquid phase crystal growth (LPCG) from Si-containing solvent has been used. To obtain sheet-shaped crystal, we studied longitudinal growth in shaping slits and graphoepitaxy on grooved glass substrates.(1) A dislocation-free single crystal Si of 12 x 5 x 3 mn^3 has been grown by the LPCG method. The surface orientation of the crystal was (111) and the resistivity was 10 - 20 OMEGAcm. By this result, we could show the possibility of the LPCG method to achieve continuous growth of dislocation-free single crystal Si sheet.(2) Th principle, it is possible to grow dislocation-free single crystal Si sheet that floats on the Sn solvent during the process (floating method). To grow Si sheets by the floating method, detailed simulation study is necessary on the Si supersaturation due to the temperature distribution taking the buoyancy effects into account.(3) The longitudinal … More LPCG method with shaping slits is the most promising method for practical production line. In this method, the solution should be introduced into the shaping slits with the assistance of the applied pressure. The temperature gradient along the shaping slits should be rigorously controlled. At the first stage, this method is applicable for solar cells. On the application for the LSI devices, more detailed electrical characterization is necessary.(4) The graphoepitaxy on grooved glass substrates may be effective for LSI application, because the thinner Si layer than 0.1 mum is easily grown by the LPCG method . However, the grooving technique to obtain periodical pattern with atomic order is necessary to be developed, which can not be achieved by the present X-ray lithography technique.(5) In order to grow large area Si sheet, it is necessary to develop a large-scale equipment, which makes it possible to feed Si material continuously, to maintain the constant solvent temperature, and to precisely control the temperature around the crystal growth region. Less
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Formation process of solar grade silicon by atomic hydrogen reduction of quartz sand
  • 批准号:
    24656103
  • 项目类别:
    Grant-in-Aid for Challenging Exploratory Research
  • 资助金额:
    $2.5万
  • 财政年份:
    2012
  • 负责人:
    YASUTAKE Kiyoshi
  • 依托单位:
Development and application of totally low-temperature semiconductor process using atmospheric-pressure plasma
  • 批准号:
    19206018
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
  • 资助金额:
    $21.88万
  • 财政年份:
    2007
  • 负责人:
    YASUTAKE Kiyoshi
  • 依托单位:
Fabrication of Large-Grained Polycrystalline Si Thin Films by Controlling Nucleation Sites on Glass Substrates
  • 批准号:
    16360070
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 资助金额:
    $6.66万
  • 财政年份:
    2004
  • 负责人:
    YASUTAKE Kiyoshi
  • 依托单位:
Formation of Monochromatic Atomic Beam for Atom interferometer
  • 批准号:
    11450059
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 资助金额:
    $9.28万
  • 财政年份:
    1999
  • 负责人:
    YASUTAKE Kiyoshi
  • 依托单位:
海外基金