Modeling of Coulomb blockade devices and circuits with random structures
Modeling of Coulomb blockade devices and circuits with random structures
批准号:
08650413
负责人:
TOYABE Toru
金额:
$0.7万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1996
资助国家:
日本
项目状态:
已结题
起止时间:
1996 至 1997
中文摘要
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英文摘要
Since Coulomb blockade takes place in tunnel junctions with very small capacitance, devices utilizing this phenomenon must have very small structures. Accordingly, experimental devices of nowadays often have random structures. In this study Coulomb blockade device circuits with two-dimensional irregular array of fine metallic particles deposited on an insulator film.The nearest neighbor fine metallic particles pair forms a tunnel junction. A system which is formed from the fine metallic particles, dots, is modelled as follows. The system of the dots is assumed to have regular two-dimensional grid structures and the randomness is taken into account by the random values of capacitance and resistance of each junction. Above the dots a gate electrode is placed, and capacitances are formed between the gate and the dots. These values are set by regular random numbers generated in compute. Critical charge for each tunnel junction is obtained by a program to use in the circuit simulation based on the orthodox theory. The influences of the difference between the cases of regular and random capacitances on the electrical characteristics are esamined.
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Y.Matsumoto, T.Hanajiri, T.Toyabe and T.Sugano: ""Experimental Observation of Coulomb Staircase in Asymmetric Tunnel Barrier System"" International Electron Devices Meeting 1996 Tech.Digest. 429-432 (1996)
Y.Matsumoto、T.Hanajiri、T.Toyabe 和 T.Sugano:““非对称隧道势垒系统中库仑阶梯的实验观察””国际电子器件会议 1996 年技术文摘。
DOI:
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发表时间:
期刊:
影响因子:
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作者:
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通讯作者:
松本、花尻、鳥谷部、菅野: "Experimental Observation of Coulomb Staircasein Asymmetric Tunnel Barrier System" International Electron Devices Meeting 1996 Tech.Digest. 429-432 (1996)
Matsumoto、Hanajiri、Toriyabe、Kanno:“库仑阶梯不对称隧道势垒系统的实验观察”国际电子器件会议 1996 年技术文摘 429-432 (1996)
DOI:
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发表时间:
期刊:
影响因子:
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作者:
[]
通讯作者:
Y.Matsumoto, T.Hanajiri, T.Toyabe and T.Sugano: ""Advantages of the Asymmetric Tunnel Barrier for High-Density Integration of Single Electron Devices"" Jpn.J.Appl.Phys.vol.36. 4143-4146 (1997)
Y.Matsumoto、T.Hanajiri、T.Toyabe 和 T.Sugano:“非对称隧道势垒在单电子器件高密度集成中的优势”Jpn.J.Appl.Phys.vol.36。
DOI:
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发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
松本、花尻、鳥谷部、菅野: "Experimental Observation of Coulomb Staircase in Asymmetric Tunnel Barrier System" International Electron Devices Meeting 1996 Tech.Digest. 429-432 (1996)
Matsumoto、Hanajiri、Toriyabe、Kanno:“非对称隧道势垒系统中库仑阶梯的实验观察”国际电子器件会议 1996 Tech.Digest 429-432 (1996)
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
松本、花尻、鳥谷部、菅野: "Experimental Observation of Coulomb Staircase in Asymmetric Tunnel Barrier System" International Electron Devices Meeting 1996 Tech. Digest. 429-432 (1996)
Matsumoto、Hanajiri、Toriyabe、Kanno:“非对称隧道势垒系统中库仑阶梯的实验观察”国际电子器件会议 1996 年技术摘要。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
共 7 条
Quantum Mechanical Simulation of Ultra Thin SOIMOSFETs
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批准号:14550332
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$0.7万
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财政年份:2002
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负责人:TOYABE Toru
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依托单位:
海外基金