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Preparation of Intermetallic Compound Silicide Film by Electrodeposition Using Molten Salt as Medium

熔盐介质电沉积制备金属间化合物硅化物薄膜

基本信息

批准号：
08650831
负责人：
HARA Motoi
金额：
$ 1.41万
依托单位：
Akita University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
1996
资助国家：
日本
起止时间：
1996 至 1997
项目状态：
已结题

项目摘要

In this work, the preparation of films of molybdenum silicides, which is the most remarkable as a super high-temperature material among silicides, was attempted by the electrodeposition using molten salt as a medium. The original plan to prepare the molybdenum silisides film in this work was as follows ;Si and Mo are deposited by turns, and their alloying can be proceeded in the molten salt at high temperature. As a result, molybdenum silicide film is formed on metal substrate. First the electrodeposition behaviors of Si and Mo were examined to clarify the deposition conditions of them. It was found that Si could be deposited in a film shape to form nickel silicide film by alloying of deposited Si and Ni substrate when the potentiostatic cathodic polarizations were carried out at the potential regions, at which K_2SiF_6 was reduced, using molten NaC1-KC1 containing K_2SiF_6. In order to deposit Mo, the other hand, the potentiostatic cathodic polarization was carried out using molten NaC1-KC1 containing Li_2Mo0_4 and K_2SiF_6. As a result, metallic Mo was deposited by the polarization at lower potential region. In accordance with their deposition conditions of Si and Mo, the electrodepositions of them were carried out by turns. When Mo was deposited after the Si deposition, Mo_3Si film could be formed on nickel siliside. Conversely, when Si was deposited after the Mo deposition, MoSi_2, which has a superior high-temperature properties, was formed in a dendrite shape. Consequently, it was found that molybdenum silicide films were prepared by the electrodeposition using molten salts.

本工作尝试以熔盐为介质，采用电沉积法制备硅化物中最引人注目的超高温材料硅化钼薄膜。本工作制备钼硅化物薄膜的原方案是：Si和Mo交替沉积，在高温熔盐中进行合金化。结果，在金属衬底上形成硅化钼膜。首先研究了Si和Mo的电沉积行为，以阐明它们的沉积条件。结果表明，在K_2SiF_6还原电位区，用含K_2SiF_6的NaCl-KCl熔体进行恒电位阴极极化，可使沉积的Si与Ni基体合金化，形成薄膜状的硅化镍膜。另一方面，为了存款Mo，使用含有Li_2MoO_4和K_2SiF_6的熔融NaCl-KCl进行恒电位阴极极化。结果表明，在低电位区极化可沉积金属钼。根据Si和Mo的沉积条件，依次进行电极沉积。当先沉积Si后再沉积Mo时，可以在镍硅化物上形成Mo_3Si薄膜。相反，当在Mo沉积之后沉积Si时，具有上级高温性能的MoSi_2以枝晶形状形成。因此，发现通过使用熔融盐的电沉积来制备硅化钼膜。