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SURFACE MODIFICATION BY HIGH INTENSITY ION BEAM IRRADIATION

高强度离子束辐照的表面改性

基本信息

批准号：
08650843
负责人：
MATSUO Jiro
金额：
$ 1.34万
依托单位：
KYOTO UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
1996
资助国家：
日本
起止时间：
1996 至 1997
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08650843/
关键词：
CLUSTER ION OXIDIZATION ETCHING SPUTTERING SiC FILM FORMATION InOx TRANSPARENT CONDUCTING FILM InOx

项目摘要

In order to realize multiple function films, a new ion beam technology is required. We have developed the gas cluster ion beam technique and studied for the fabrication of the multiple function films. A cluster ion is an aggregate of a few to several thousands atoms, and it transports a large amount of atoms as one ion. When a cluster impacts a surface, high-density energy deposition and multiple-collision are realized. Therefore the energy state of the bombarded area becomes extremely high, and subsequently, the reactivity on the surface with cluster ion beam is higher than conventional ion beam techniques. In this study, the surface smoothing of the diamond films and the fabrication of ITO(Indium Tin Oxide)films with O_2 cluster ion irradiation were studied.The diamond surface irradiated with Ar cluster ions became very smooth. It is caused by high dense of ion irradiation and the smoothing effect of the lateral sputtering. After irradiation, the diamond surfaces became brown because of the formation of graphite layr on the surface. However, it can be removed by reactive O_2 cluster irradiation. This result indicates that multiple function surfaces can be formed with both physical and reactive cluster beams. Besides, high transparent and high conducting ITO film can be formed at room temperature with O_2 cluster ion irradiation during the deposition of In and Sn. The transparency and conductivity of this film is higher than that with conventional techniques that are done at 300ﾟC.These results indicate that cluster ion beams are useful for the surface treatment and film formations of next generation.

为了实现薄膜的多功能化，需要一种新的离子束技术。我们发展了气体团簇离子束技术，并对多功能薄膜的制备进行了研究。团簇离子是几个到几千个原子的聚集体，并且它作为一个离子传输大量原子。当团簇撞击表面时，实现了高密度的能量沉积和多次碰撞。因此，被轰击区域的能态变得非常高，并且随后，用团簇离子束在表面上的反应性高于常规离子束技术。本论文研究了O_2团簇离子辐照金刚石薄膜的表面平整化和ITO（Indium Tin Oxide）薄膜的制备。这是由于高密度的离子辐照和横向溅射的平滑效应造成的。辐照后，金刚石表面由于石墨层的形成而呈褐色。而反应性O_2团簇辐照则可将其去除。这一结果表明，多个功能表面可以形成与物理和反应团簇束。此外，在室温下，用O_2团簇离子辐照沉积In和Sn时，可以形成高透明、高导电性的ITO薄膜。该膜的透明度和导电性高于在300 ° C下完成的常规技术。这些结果表明，团簇离子束可用于下一代的表面处理和膜形成。