Development of precision goniometer compatible with oxygen atmosphere and ultrahigh temperature for surface analyses of pulsed laser deposition oxide thin films

开发与氧气气氛和超高温兼容的精密测角仪，用于脉冲激光沉积氧化物薄膜的表面分析

• 批准号: 10555308
• 负责人: KAWASAKI Masashi
• 金额: $ 8.77万
• 依托单位: Tokyo Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1998
• 资助国家: 日本
• 起止时间: 1998 至 1999
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-10555308/
• 关键词: Goinometer; Growth dynamics; Surface characterization tools; Pulsed laser deposition; Laser heating; Nd:YAG laser; Step-flow growth mode; Bearings; Optical fiber; マイクロゴニオメータ; レーザ加熱; STM; イオン散乱

The goal of this study is to develop a precise goniometer which can handle the specimen in an environment of any given oxygen pressure from UHV to atmospheric pressure at an elevated temperature of over 1000℃ without any magnetic field noise which would be introduced if the specimen is heated by electric current. Therefore, we chose laser beam as a heat source, In the first year, we have developed simple heating stage and optics for using a cw Nd:YAG laser beam to accomplish highest heating temperature of 1400℃. In the second year, special optical fiber and optics were designed and fabricated to fit this technique to a goniometer having 6-axis motion. The bearings which allow the sample stage to rotate smoothly at high temperature was the most difficult part of this study. Finally, we could fabricate the goniometer having the proposed specification.

本研究的目的是研制一种精密的测角仪，它能在1000℃以上的高温下，在从超高真空到大气压的任何给定氧气压力的环境中处理样品，而没有任何磁场噪声，如果用电流加热样品，则会引入磁场噪声。因此，我们选择了激光束作为热源，在第一年，我们已经开发了简单的加热平台和光学使用连续Nd：YAG激光束，以实现最高加热温度为1400℃。在第二年，特殊的光纤和光学设计和制造，以适应这种技术的测角仪具有6轴运动。使样品台在高温下平稳旋转的轴承是本研究中最困难的部分。最后，我们可以制造具有所提出的规格的测角仪。

项目成果

M. Lippmaa: "Growth mode control of SrtiO_3 epitaxy"Proceedings of the third Synposium on Atomic Scale Surface and Interface dynamics. 3. 171-174 (1999)

M. Lippmaa：“SrtiO_3外延的生长模式控制”第三届原子尺度表面和界面动力学研讨会论文集。

S. Ohashi: "Compact laser molecular beam epitaxy system using laser heating of substrat for oxide film growth"Rev. Sci. Instrum.. 70. 178-183 (1999)

S. Ohashi：“利用激光加热衬底进行氧化膜生长的紧凑型激光分子束外延系统”Rev.

M. Lippmaa: "Dynamics of SrTiOィイD23ィエD2 surface during wet etching and high-temperature annealing"Ferroelectrics. 224. 373-378 (1999)

M. Lippmaa：“湿法蚀刻和高温退火过程中 SrTiO2 表面的动力学”铁电体 224. 373-378 (1999)。

M.Lippmaa: ""Step-flow growth of SrTiO_3 thin films with a dielectric constant exceeding 10^4""Appl.Phys.Lett.. 74. 3543-5345 (1999)

M.Lippmaa：“介电常数超过 10^4 的 SrTiO_3 薄膜的步进流生长”Appl.Phys.Lett.. 74. 3543-5345 (1999)

M. Lippmaa: "Step-flow growth of SrtiO_3 thin films with a dielectric constant exceeding"Appl. Phys. Lett.. 74. 3543-5345 (1999)

M. Lippmaa：“介电常数超过的SrtiO_3薄膜的步进流生长”Appl。