Bonding Mechanism of Metal/porcelain Clarified by using Nano-probe TEM

使用纳米探针 TEM 阐明金属/陶瓷的结合机制

• 批准号: 10671832
• 负责人: OHTA Michio
• 金额: $ 2.24万
• 依托单位: Kyushu University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1998
• 资助国家: 日本
• 起止时间: 1998 至 1999
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-10671832/
• 关键词: Porcelai fused to metal; Bonding mechanism; TEM; FIB; Nano-probe EM; Ion bombardment; 陶材焼付け; ナノプロープ電顕

The purpose of this study was to clarify the bonding mechanism between metal and porcelain by observing high resolution lattice image and analyzing chemical composition at and near the interface by using nano-probe transmission electron microscope. However, we could not succeed in preparing thin specimens for the high resolution TEM observation. Accordingly we changed the purpose of this study.We tried to make a diffuse interface between metal and porcelain through which some constituents of porcelain distribute continuously. For this purpose, ion bombardment technic was applied to the gold alloy surface. The amount of Al and Si ions implanted were 1X10ィイD117ィエD1ion/cmィイD12ィエD1. The result of ESCA analysis indicated that concentration of Al and Si atoms decreased gradually from the ion irradiated surface to the interior of the alloy. This result suggests a possibility of making a diffuse interface between metal and porcelain through which some constituents of porcelain distribute continuously. However, shear bond strength of metal / porcelain interface showed no significant difference between ion-implanted and not-implanted specimens.

本研究的目的是通过纳米探针透射电子显微镜观察高分辨率点阵图像和分析界面处及附近的化学成分来阐明金瓷结合的机理。然而，我们不能成功地制备薄样品的高分辨率透射电镜观察。因此，我们改变了本研究的目的，试图在金属和陶瓷之间制造一个扩散界面，使陶瓷中的某些成分在界面上连续分布。为此，离子轰击技术应用于金合金表面。注入的Al和Si离子的量为1 × 10 ↑ [-1] D117 ↑ [-1] D1 ion/cm ↑ [-1] D12 ↑ [-1] D1。ESCA分析结果表明，Al和Si原子浓度从离子辐照表面向合金内部逐渐降低。这一结果表明，在金属和陶瓷之间形成一个扩散界面的可能性，陶瓷的某些成分通过该扩散界面连续分布。而金属/瓷界面的剪切粘结强度在离子注入与未注入之间无显著性差异。