Magetoresistance Effect of Nanostructure Film Produced by Pulse Electrodeposition Method

脉冲电沉积法制备纳米结构薄膜的磁阻效应

• 批准号: 11650670
• 负责人: UEDA Yuji
• 金额: $ 1.15万
• 依托单位: Muroran Institute of Technogy
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1999
• 资助国家: 日本
• 起止时间: 1999 至 2001
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-11650670/
• 关键词: Pulse Electrodeposition; Ferromagnetic Metal; Non-ferromagnetic Metal; Multilayered Film; Alloy Film Magnetism; Eectroresistance; Computer Controlling; コンピュータ制御

Research on physical properties of nanostructured materials ha attracted attention in term of fundamental physics and applications. Recent research on magneto-resistance (MR) for thin films produced in the combination of ferromagnetic and non-magnetic metals is based on films grown mainly from the vapor phase and the magnetoresistance of the films exhibits different values depending on their production method.Electrodeposition is an advantageous method for producing alloys and metallic multilayers of generally immiscible metal combinations simply by controlling the electrodeposition condition. However, it provides the possibility of depositing film structure different from those being produced from the vapor phase.In this study, we have investigated the relationships between the magetoresistance effect and the film structure in the nanostructured multilayered films prepared by the pulse electrodeposition method.

纳米结构材料的物理性质的研究在基础物理和应用方面引起了人们的关注。目前对铁磁金属和非磁性金属组合制备的薄膜的磁阻研究主要基于气相生长的薄膜，薄膜的磁电阻值随制备方法的不同而不同。电沉积是一种通过控制电沉积条件来制备合金和通常不相容的金属组合的金属多层膜的有利方法。然而，它提供了沉积不同于气相沉积的薄膜结构的可能性。在本研究中，我们研究了用脉冲电沉积方法制备的纳米结构多层膜中磁阻效应与薄膜结构的关系。

项目成果

Y.Ueda, W.Takakura, A.Yamada: "Electrical resistivity and magnetism of Fe/Si multilayers prepared by oblique incidence evaporation"J.Magn.Magn.Mater.. 66. (2001)

Y.Ueda、W.Takakura、A.Yamada：“斜入射蒸发制备的 Fe/Si 多层膜的电阻率和磁性”J.Magn.Magn.Mater.. 66. (2001)

Yuji Ueda,Takeshi Houga,Akihiro Yamada and Hasan Zaman: "Effect of Composition near the Layer Boundary on GMR for Co/Cu,Ag Multilayers Electrodeposited by Pulse Method"J.Magn.Soc.Jpn.. 23[1-2]. 120-122 (1999)

Yuji Ueda、Takeshi Houga、Akihiro Yamada 和 Hasan Zaman：“层边界附近的成分对脉冲法电沉积 Co/Cu、Ag 多层膜 GMR 的影响”J.Magn.Soc.Jpn.. 23[1-2]。

Y.Ueda,T.Houga,H.Zaman,A.Yamada: ""Magnetoresistance Effect of Co-Cu Nanostructure Prepared by Electrodeposition Method"J. Solid State Chem.. 147. 274-280 (1999)

Y.Ueda,T.Houga,H.Zaman,A.Yamada：“电沉积法制备的Co-Cu纳米结构的磁阻效应”J.Solid State Chem.. 147. 274-280 (1999)

池田正二, 近澤 進, 高倉 亘, 宝賀 剛, 上田勇治: "MA Co_xCu_<100-x>合金の磁気抵抗及び磁性の温度依存性"日本応用磁気学会誌. 23. 1133-1136 (1999)

Shoji Ikeda、Susumu Chikazawa、Wataru Takakura、Tsuyoshi Hoga、Yuji Ueda：“MA Co_xCu_<100-x> 合金的磁阻和磁性的温度依赖性”日本应用磁学学会杂志 23. 1133-1136 (1999)。

Shoji Ikeda, Wataru Takakura, Susumu Chikazawa, Yuji Ueda: "Magnetic Properties and GMR Effect for Nonequilibrium Co-Cu Alloys Produced by Mechanical Alloying"J. Magn. Soc. Jpn.. 23[1-2]. 138-140 (1999)

Shoji Ikeda、Wataru Takakura、Susumu Chikazawa、Yuji Ueda：“机械合金化生产的非平衡钴铜合金的磁性能和 GMR 效应”J。