Theoretical analysis of lasing characteristics of stacked lnGaN quantum dot lasers from atomic scale
Theoretical analysis of lasing characteristics of stacked lnGaN quantum dot lasers from atomic scale
批准号:
12650004
负责人:
SAITO Toshio
金额:
$1.6万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2001
中文摘要
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英文摘要
We have analyzed the electronic structures of ln_<0.2>Ga_<0.8>N pyramidal quantum dots (QDs) in a GaN barrier layer using a polarization-potential dependent sp^3 tight-binding method. A valence-force-field method using the Keating potential was used for the strain and atom-position calculations. For the QD with the diameter 86.4 A, height of 20.8 A, and facet inclination angle of 30 degree, the maximum piezoelectric field is calculated to be1.64 MV/cm. The energy gap shows a red shift of 0.100 eV due to the quantum-confined Stark effect. The field causes a spatial separation of the electron and hole wave functions in the QD. The number of electron-hole pairs, which can screen the field totally, is estimated as a function of the diameter. We find that 13 electron-hole pairs are required for the complete field screening for the QD with the diameter 86.4 A. In experiments by Damilano et al., the photoluminescence peak energy, E_<PL>, of 2.71 eV (at room temperature) was measured for the MBE-grown In_<0.2>Ga_<0.8>N QDs with the similar QD size ; diameter = 100 A, heitht = 20 A. Eg = 2.706 eV for the pyramidal QD is in better agreement with the measured energy, E_<PL> = 2.71 eV, than Eg = 2.502 eV for the prismatic QD.
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T.Saito: "Electronic Structure of InCaN Quantum Dots in GaN : Atomic Scale Calculations"Extended Abstracts of 2000 Int.Conf.on Solid State Devices and Materials (Sendai, Japan, Aug.29-31, 2000). (2000)
T.Saito:“GaN 中 InCaN 量子点的电子结构:原子尺度计算”2000 年固态器件和材料国际会议的扩展摘要(日本仙台,2000 年 8 月 29-31 日)。
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T. Saito, and Y. Arakawa: ""Effects of internal piezoelectric field on electronic states of InGaN quantum dots grown on GaN,""J. of Crystal Growth. (in press).
T. Saito 和 Y. Arakawa:“内部压电场对在 GaN 上生长的 InGaN 量子点的电子态的影响”,J.
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T.Saito: "Electronic states of GaN-based quantum dots"Proc.of 5th Symp.on Atomic-Scale Surface and Interface Dynamics (Tokyo, Japan, March 1-2,2001).. 45-48 (2001)
T.Saito:“基于 GaN 的量子点的电子态”Proc.of 5th Symp.on Atomic-Scale Surface and Interface Dynamics(日本东京,2001 年 3 月 1-2 日).. 45-48 (2001)
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T.Saito: "Quantum confined electronic states in In GaN dots embedded in GaN"Proc. of 27th Int. Symp. on Compound Semiconductors. 285-290 (2000)
T.Saito:“嵌入 GaN 中的 In GaN 点中的量子限制电子态”Proc。
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T.Saito: "Quantum confined electronic states in InGaN dots embedded in GaN : Tight-binding calculation"Proc.of 27th Int.Symp.on Compound Semiconductors, Monterey, California, 2000. (in press). (2001)
T.Saito:“嵌入 GaN 中的 InGaN 点中的量子限制电子态:紧束缚计算”Proc.of 27th Int.Symp.on 化合物半导体,蒙特利,加利福尼亚州,2000 年。(印刷中)。
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