Metal Deposition Process from Quaternary Ammonium Triflate-type Non-aluminate Room Temperature Molten Salts
三氟甲磺酸季铵型非铝酸盐室温熔盐金属沉积工艺
基本信息
- 批准号:12650733
- 负责人:
- 金额:$ 2.3万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (C)
- 财政年份:2000
- 资助国家:日本
- 起止时间:2000 至 2001
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The redox and/or electrodeposition behaviors of copper, nickel, zinc, titanium, magnesium, and Cu-Mg alloy were examined using an "ammonium imide" room temperature molten salt as a novel electrolytic medium in order to clarify the applicability of the salt to the electrochemical process. Trimethyl-n-hexylammonium bis((trifluoromethyl)sulfonyl)amide (TMHA-Tf_2N), having an electrochemical window of 5.6 V (50 ℃), and metal salts were used to prepare the electrolyte. In TMHA-Tf_2N media monovalent copper ion, Cu(I), was stable and Cu metal was oxidized, or corroded, in the presence of Cu(II) species as : Cu^2+ + Cu → 2Cu^+. Cathodic electrodeposition of copper metal and its anodic dissolution were, thus, one-electron reactions and their current efficiencies were almost 100%.Nickel, zinc, and Cu-Mg alloy can also be electrodeposited from the TMHA-Tf_2N media at a certain potentiostatic condition. The nickel and zinc metals deposited appeared as a gray-colored film, while the magnesium was dendritic. In contrast, though the TMHA-Tf_2N salt containing titanium species gave the redox current of dissolving titanium species, titanium metal was not able to deposit electrochemically.The TMHA-Tf_2N salt containing both Cu^+ and Mg^<2+> ions, provided an Cu-Mg alloy containing about 23 at. % Mg. X-ray diffraction of the alloy gave a set of reflection due to elemental copper, suggesting that the magnesium formed a solid solution with copper.
研究了一种新型的“亚胺铵”室温熔盐作为电解介质对铜、镍、锌、钛、镁和Cu-Mg合金的氧化还原和/或电沉积行为,以阐明该盐在电化学过程中的适用性。采用电化学窗口为5.6V(50 ℃)的双(三氟甲基磺酰基)酰胺三甲基正己基铵(TMHA-Tf_2N)和金属盐制备电解质。在TMHA-Tf_2N介质中,一价铜离子Cu(I)是稳定的,Cu(II)以Cu^2+ + Cu → 2Cu^+形式存在时,金属Cu被氧化或腐蚀。结果表明,金属铜的阴极电沉积和阳极溶解均为单电子反应,电流效率接近100%,在一定的恒电位条件下,TMHA-Tf_2N体系还可以电沉积镍、锌和铜镁合金。沉积的镍和锌金属呈现为灰色膜,而镁为树枝状。相比之下,虽然含有钛物种的TMHA-Tf_2 N盐提供了溶解钛物种的氧化还原电流,但钛金属不能电化学存款。含有Cu^+和Mg^<2+>离子的TMHA-Tf_2 N盐提供了含有约23原子的Cu-Mg合金。%的Mg。合金的X射线衍射给出了一组由于元素铜的反射,表明镁与铜形成了固溶体。
项目成果
期刊论文数量(9)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
K. Murase, K. Nitta, T. Hirato, and Y. Awakura: "Electrochemical Behavior of Copper in Ammonium Imide Type Room Temperature Molten Salt"Proseeding of the 2nd International Conference on Processing Materials for Properties, B. Mishra and C. Yamauchi (eds.)
K. Murase、K. Nitta、T. Hirato 和 Y. Awakura:“铜在亚胺铵型室温熔盐中的电化学行为”第二届国际加工材料性能会议论文集,B. Mishra 和 C. Yamauchi
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- 影响因子:0
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K.Murase: "Electrochemical Behavior of Copper in Trimethyl-n-hexylammonium Bis((trifluoromethyl)sulfonyl)amide, an Ammonium Imide Type RTMS"Journal of Applied Electrochemistry. 31・10. 1089-1094 (2001)
K.Murase:“三甲基正己基铵双((三氟甲基)磺酰基)酰胺中铜的电化学行为,亚胺型RTMS”应用电化学杂志31・10 (2001)。
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- 影响因子:0
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K.Murase,K.Nitta,T.Hirato and Y.Awakura: "Elctrochemical Behavior of Copper in Ammonlum Imide Type Room Temperature Molten Salt"Proceedings of 2nd International Conference on Processing Materials for Properties, TMS. 783-788 (2000)
K.Murase、K.Nitta、T.Hirato 和 Y.Awakura:“铜在氨酰亚胺型室温熔盐中的电化学行为”第二届国际加工材料性能会议记录,TMS。
- DOI:
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- 影响因子:0
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Kuniaki Murase: "Electrochemical Behavior of Copper in Trimethyl-n-hexylammonium Bis((trifluoromethyl)-sulfonyl)amide, an Ammonium Imide-type Room Temperature Molten Salt"Journal of Applied Electrochemistry. 31(10). 1089-1094 (2001)
Kuniaki Murase:“铜在三甲基正己基铵双((三氟甲基)磺酰基)酰胺(一种亚胺铵型室温熔盐)中的电化学行为”应用电化学杂志。
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- 影响因子:0
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Tetsuji Hirato: "The Electrolytic Codeposition of Silica Particles with Alminium from AlCl_3-Dimethylsulfone Electrolytes"Journal of the Electrochemical Society. 148(4). C280-C283 (2001)
Tetsuji Hirato:“AlCl_3-二甲砜电解质中二氧化硅颗粒与铝的电解共沉积”电化学学会杂志。
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HIRATO Tetsuji其他文献
HIRATO Tetsuji的其他文献
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{{ truncateString('HIRATO Tetsuji', 18)}}的其他基金
Electrodeposition of bright and purified aluminum coatings from organic solvent baths with additives
使用添加剂从有机溶剂浴中电沉积光亮且纯净的铝涂层
- 批准号:
24360308 - 财政年份:2012
- 资助金额:
$ 2.3万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Development of alloy plating with high corrosion resistivity without chromate treatments-Addition of self healing property by valence fluctuation
无需铬酸盐处理的高耐腐蚀性合金镀层的开发-通过价数波动增加自修复性能
- 批准号:
19360340 - 财政年份:2007
- 资助金额:
$ 2.3万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
IMPROVEMENT OF ELECTRIC PROPERTIES OF ELECTRODEPOSITED CdTe FOR SOLAR CELL BY MICROSTRUCTURE CONTROL
通过微观结构控制改善太阳能电池用电沉积 CdTe 的电性能
- 批准号:
17360370 - 财政年份:2005
- 资助金额:
$ 2.3万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Development of a Soft Process for CdTe Solar Cell using Photo-assisted Electrodeposition
利用光辅助电镀技术开发 CdTe 太阳能电池软工艺
- 批准号:
14350399 - 财政年份:2002
- 资助金额:
$ 2.3万 - 项目类别:
Grant-in-Aid for Scientific Research (B)
Preparetion of Rare-earth Metal Films by Electrochemical Deposition from Non-aqueous Madia with High-purity
高纯非水介质电化学沉积制备稀土金属薄膜
- 批准号:
09650808 - 财政年份:1997
- 资助金额:
$ 2.3万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
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