GENERATING AND ITS EVALUATION OF NANO-TEXTURE ON THE BASIS OF SELF-ORGANIZATION OF ATOMS AND PRE-PATTERNED NUCLEI

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We have reported that free silicon molecules grew horizontally along a silicon substrate surface under a certain condition, so-called, a step-flow type growth, and could compose both a nano-meter order flatness and a perfect crystal structure by applying molecular Beam Epitaxy (MBE).In this study, it is clarified that the above mentioned step-flow type growth of silicon molecules can be either constrained or changed its growing direction by such geometrical patterns as regularly positioned micro-holes and grooves which are pre-shaped on the surface of silicon substrate before epitaxial deposition processes. As a result, the surface of silicon substrate can be textured at a nano-meter order.The mechanism of texturing is discussed in view of chemophysical deposition process and constriction of molecules under the step-flow depositing conditions. Micro steps are generated toward a certain orientation which is decided by a direction of substrate inclination and this growth is hindered by the pre-shaped pattern, hence, a square-like texture with a pitch of the pattern and a nano-meter order roughness inside of the texture patch is generated.It is revealed that various types of textured surfaces can be obtained by combining the pre-shaped geometrical patterns and depositing conditions. These silicon nano-textures are expected to be used for micro-optomechatronic contacts, replica surface of LIGA process and etc.