Dynamic Scaling Study of Thin Films in electrodeposition Growth Using AFM
使用 AFM 进行电沉积生长薄膜的动态尺度研究
基本信息
- 批准号:13650029
- 负责人:
- 金额:$ 1.73万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (C)
- 财政年份:2001
- 资助国家:日本
- 起止时间:2001 至 2002
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
(1) Three-dimensional growth in electrodepositionWe have made investigation into scaling properties of nickel surfaces grown by pulse-current electrodeposition using atomic force microscopy. The surface growth exhibits an anomalous dynamic scaling behavior characterized by a local roughness exponent ζ_<loc>, global scaling exponent ζ and dynamic exponent z for an intermediate time regime I^z < L^z where I and L denote a window length and system size. The local interface width of the nickel surfaces leads to ζ_<loc>=1.0, global scaling exponent ζ=2.8 and dynamic exponent z=4.1. All the experimental data collapse on a plot of the anomalous scaling function.(2) Two-dimensional growth in electrodepositionSurface growth of Ni thin films electrodeposited on (100) Ni substrates has been investigated using atomic force microscopy. In the early stage of growth, islands nucleated on the (100) Ni substrates, which appear to be rectangular in cross section, grow laterally in the same crystallographic orientation. Growth surfaces are shown to display a normal scaling behavior characterized by the linear surface diffusion universality class. Along the time evolution, instability in growth occurs and a transition from two-dimensional growth to three-dimensional growth is observed. In this stage, surface growth obeys anomalous scaling characterized by a local roughness exponent ζ_<loc>=1.0, global scaling exponent ζ=2.1 and dynamic exponent z=1.0.
(1)电沉积中的三维生长我们用原子力显微镜研究了脉冲电沉积镍表面的结垢特性。表面生长表现出异常的动力学标度行为,其特征在于局部粗糙度指数ε_<loc>,全局标度指数ε_和动力学指数z,对于中间时间制度I^z < L^z,其中I和L表示窗口长度和系统尺寸。镍表面的局部界面宽度导致η <loc>=1.0,全局标度指数η =2.8和动力学指数z=4.1。所有的实验数据都在反常标度函数的曲线图上崩溃。(2)电沉积中的二维生长用原子力显微镜研究了(100)Ni基片上电沉积Ni薄膜的表面生长。在生长的早期阶段,在(100)Ni衬底上成核的岛,其横截面看起来是矩形的,以相同的晶体学取向横向生长。生长表面显示出正常的缩放行为,其特征在于由线性表面扩散普适性类。沿着时间演化,生长出现不稳定性,观察到从二维生长到三维生长的转变。在这一阶段,表面生长服从异常标度,其特征在于局部粗糙度指数<loc>=1.0,整体标度指数=2.1和动力学指数z=1.0。
项目成果
期刊论文数量(18)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
M.Saitou, W.Oshikawa, A.Makabe: "Characterization of electrodeposited nickel film surfaces using atomic force microscopy"J. Phys. Chem. Solids. (to be published). (2002)
M.Saitou、W.Oshikawa、A.Makabe:“使用原子力显微镜表征电沉积镍膜表面”J。
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- 影响因子:0
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- 通讯作者:
K.Hamaguchi, W.Oshikawa, M.Saitou: "Electrochemical Impedance Spectroscopy Study of Electrochemical Reactions on Single-crytsalline Nickel Surfaces in Nickel Sulfamate"202th Electrochemical Society Meeting-SaltLake City, USA CDROM. 480 (2002)
K.Hamaguchi、W.Oshikawa、M.Saitou:“氨基磺酸镍中单晶镍表面电化学反应的电化学阻抗谱研究”第 202 届电化学学会会议-美国盐湖城 CDROM。
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- 影响因子:0
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M.Saitou, W.Oshikawa, M.Mori, A.Makabe: "Surface Roughening in the Growth of Direct Current or Pulse Current Electrodeposited Nickel Thin Films"J.Electrochem.Soc.. 148. C780-C783 (2001)
M.Saitou、W.Oshikawa、M.Mori、A.Makabe:“直流电或脉冲电流电沉积镍薄膜生长中的表面粗糙化”J.Electrochem.Soc.. 148. C780-C783 (2001)
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- 影响因子:0
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M.Saitou: "Anomalous scaling of nickel surfaces in pulse-current electrodeposition growth"Phys.Rev.B. 66. 73416-73419 (2002)
M.Saitou:“脉冲电流电沉积生长中镍表面的异常结垢”Phys.Rev.B。
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- 发表时间:
- 期刊:
- 影响因子:0
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- 通讯作者:
M. Saitou, W. Oshikawa, M. Mori, and A. Makabe: "Surface Roughness in the Growth of Direct Current or Pulse Current Electrodeposited Nickel Thin Films"J. Electrochem. Soc.. 148. C780-C783 (2001)
M. Saitou、W. Oshikawa、M. Mori 和 A. Makabe:“直流电或脉冲电流电沉积镍薄膜生长中的表面粗糙度”J。
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- 影响因子:0
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SAITOU Masatoshi其他文献
SAITOU Masatoshi的其他文献
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{{ truncateString('SAITOU Masatoshi', 18)}}的其他基金
A study on the formation mechanism of internal stress in electrodeposition within the framework of dynamic scaling theory
动态尺度理论框架下电沉积内应力形成机制研究
- 批准号:
22560025 - 财政年份:2010
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$ 1.73万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Study on Charge Transfer Reactions in Electrodeposition
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15560021 - 财政年份:2003
- 资助金额:
$ 1.73万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
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电沉积制备晶须定向分布增强金属基复合材料
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- 资助金额:23.0 万元
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