Ultra trace characterization of small droplets with x-ray fluorescence analysis using x-ray microbeam

使用 X 射线微束通过 X 射线荧光分析对小液滴进行超痕量表征

• 批准号: 13650870
• 负责人: HAYAKAWA Shinjiro
• 金额: $ 1.41万
• 依托单位: HIROSHIMA UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-13650870/
• 关键词: x-ray fluorescenceanalysis; microbeam; liquid droplet; detection limits; trace analysis; 放射光; 蛍光X線分析; 微小液滴0

X-ray fluorescence analysis was carried out using an x-ray microprobe system dedicated in the BL37XU of the SPring-8. A thin film of Cu evaporated 1.2 nm onto the Kapton substrate was utilized for evaluating the minimum detection limits. By employing the optimized detection geometry the detection limits of 50 ag (or Cu atoms of 5 × 10^5) was achieved. The obtained detection limits is one of the lowest values reported in the worldTo generate micro droplets a droplet-generator was utilized which is driven by the piezo actuators. Liquid droplets were titrated onto the thin films of polypropylene, and the droplets fixed with the vapor of the cyanoacrylate or the residue of the dried droplets were examined. A combination of the droplet-generator and the automated XY stage has enabled us to generate a small droplet down to 30 pL onto the designed position. However surface characteristics of the substrate strongly affects the resultant position and the residue of,the droplets. A hydrophilic surface widen the size of the residue, and the hydrophobic surface often change the position of the residue from the initial position

使用SPring-8的BL 37 XU专用的X射线微探针系统进行X射线荧光分析。在Kapton基底上蒸发1.2 nm的Cu薄膜用于评估最小检测限。通过采用优化的检测几何结构，实现了50个Ag（或5 × 10^5个Cu原子）的检测限。所获得的检测限是世界上报道的最低值之一。为了产生微滴，利用由压电致动器驱动的液滴发生器。将液滴滴定到聚丙烯薄膜上，并检查用氰基丙烯酸酯蒸气固定的液滴或干燥液滴的残留物。液滴发生器和自动XY载物台的组合使我们能够在设计位置上产生低至30 pL的小液滴。然而，基板的表面特性强烈地影响所得到的位置和液滴的残留。亲水性表面使残基的大小变宽，疏水性表面常常使残基的位置从初始位置改变

项目成果

早川 慎二郎: "微小ビーム強度モニターの開発とマイクロビームX線分析への応用"X線分析の進歩. 34. 133-141 (2003)

Shinjiro Hayakawa：“微束强度监测仪的开发及其在微束 X 射线分析中的应用”X 射线分析进展 34. 133-141 (2003)。