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Study of Secondary Electron Image Contrast of Sample Surfaces Scanned by Focused Ion Beams

Study of Secondary Electron Image Contrast of Sample Surfaces Scanned by Focused Ion Beams
聚焦离子束扫描样品表面二次电子图像对比度研究
批准号:
14550026
负责人:
OHYA Kaoru
金额:
$1.22万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2002
资助国家:
日本
项目状态:
已结题
起止时间:
2002 至 2003

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OHYA Kaoru的其他基金

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中文摘要
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英文摘要
A scanning ion microscope (SIM) has been employed both by scanning a gallium (Ga) focused ion beam (FIB) on a sample surface and by detecting secondary electrons (SEs) emitted from the sample. Although the image formation mechanism present in the SIM is similar to that in a scanning electron microscope (SEM) there are some differences in image properties for materials, surface topography, grain contrast, and so on. In order to study the difference between STM and SEM images, a Monte Carlo simulation of ion-induced and electron-induced secondary electron emission was performed for 17 metals with atomic numbers, Z_2, of 4 -79 under Ga ion and electron bombardment with energies of several tens of and several keV. The SEs are produced in the SIM through collisions with three different collision partners : projectile ions, recoiled target atoms, and target electrons. The basic concept of our Monte Carlo model is to simulate all the trajectories of collision partners.The SE yield for Ga ion bombardment generally decreases with increasing Z_2, whereas the SE yield for electron bombardment increases. This explains the origin of the opposite trend in the material contrast between SIM and SEM. The lateral distribution of SEs escaped from the surface, which was much narrower for Ga ions than for electrons, indicates that the spatial resolution of SE images is better for SIM than SEM. For comparison between topographic contrasts in SIM and SEM, pseudo-images of semicircular rods with different radii were reconstructed from a line profile of the SE intensity obtained by the beam scan on the pattern. They revealed the topographic contrast for heavy metals is clearer in SIM than in SEM, whereas for light metals both contrasts are similar to each other. When scanning a step with large height and small wall angle, the bright area on the step caused by an edge effect was less for Ga ions than for electrons, so that the inclined wall is clearly observed in the SIM.
期刊论文(37)
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会议论文
Kaoru Ohya: "Monte Carlo study of secondary electron emission from SiO2 induced by focused ion beams"Applied Surface Science. (In press). (2004)
Kaoru Ohya:“聚焦离子束诱导的 SiO2 二次电子发射的蒙特卡罗研究”应用表面科学。
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K.Ohya, T.Ishitani: "Target material ; dependence of secondary electron images induced by focused ion beams"Surface and Coatings Technology. Vol.158-159. 8-13 (2002)
K.Ohya、T.Ishitani:“目标材料;聚焦离子束引起的二次电子图像的依赖性”表面和涂层技术。
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Kaoru Ohya: "Simulation study of secondary electron images in scanning ion microscopy"Nuclear Instruments and Methods in Physics Research B. Vol.202. 305-311 (2003)
Kaoru Ohya:“扫描离子显微镜中二次电子图像的模拟研究”物理研究中的核仪器和方法 B. Vol.202。
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Kaoru Ohya: "ELECTRAN-Monte Carlo Program of Secondary Electron Emission from Monoatomic Solids under the Impact of 0.1-10 keV Electrons"Research Report at the National Institute for Fusion Science. NIFS-DATA-84. 1-66 (2004)
Kaoru Ohya:《在 0.1-10 keV 电子冲击下单原子固体二次电子发射的 ELEECTRAN-蒙特卡罗计划》在国立核聚变科学研究所的研究报告。
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23
    Simulation for evaluation of secondary electron signals in helium ion microscope
    • 批准号:
      24560029
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $3.33万
    • 财政年份:
      2012
    • 负责人:
      OHYA Kaoru
    • 依托单位:
    Computer Simulation of Plasma-Surface Interactions in Fusion Devices
    • 批准号:
      09680494
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $1.6万
    • 财政年份:
      1997
    • 负责人:
      OHYA Kaoru
    • 依托单位:
    Computer Simulation of Secondary Electron Emission From Plasma Facing Materials in Controlled Fusion Devices
    • 批准号:
      06680481
    • 项目类别:
      Grant-in-Aid for General Scientific Research (C)
    • 资助金额:
      $1.28万
    • 财政年份:
      1994
    • 负责人:
      OHYA Kaoru
    • 依托单位: