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Computer Simulation of Secondary Electron Emission From Plasma Facing Materials in Controlled Fusion Devices

Computer Simulation of Secondary Electron Emission From Plasma Facing Materials in Controlled Fusion Devices
受控聚变装置中等离子体表面材料二次电子发射的计算机模拟
批准号:
06680481
负责人:
OHYA Kaoru
金额:
$1.28万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995

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中文摘要
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英文摘要
Particle-induced secondary electron emission from plasma-facing materials (PFM) in magnetic cofinement thermonuclear fusion devices is a plasma-surface interaction process of considerable importance for impurity production due to sputtering of the PFM.In this study, We have developed a Monte Carlo simulation (MCS) model of secondary electron emission from PFMs, which calculates the energy and angular distributions of emitted secondary electrons as well as the secondary electron yield.The MCS model is applied to bowl-and ripple-structures for the study of surface roughness effects on the energy and angular distributions of secondary electrons, as well as the secondary electron yield of the PFM under electron bombardment. With increasing roughness, the secondary electron yield becomes greater than that for a flat surface, whereas for large roughness the yield is smaller ; the former is due to the low-energy component in the energy distribution, and the latter results in a decrease the number of electrons emitted with oblique angles.The MCS model is also combined with an electron transport model in a sheath which is found at the interface between the surface and an edge plasma. In addition to acceleration of an electric field normal to the surface, there are gyromotion of emitted electrons in the sheath subjected to an oblique magnetic field. Some of the secondary electrons return to the surface within their first gyromotion, resulting in a considerably low effective secondary electron yield. The lowering of the yield is accompanied with a low-energy shift of the energy distribution.
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DOI: --
发表时间:
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作者: []
通讯作者:
J.Kawata K.Ohya and K.Nishimura: "Simulation of Secondary Electron Emission from Rough Surfaces" J.Nucl.Mater.Vol.220-222. 997-1000 (1995)
J.Kawata K.Ohya 和 K.Nishimura:“粗糙表面二次电子发射的模拟”J.Nucl.Mater.Vol.220-222。
DOI: --
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作者: []
通讯作者:
K.Ohya, K.Hiroi and J.Kawata: "Simulation of Secondary Electron Emission from Solid Surface Irradiated by Plasmas" Jpn.J.Appl.Phys.Vol.34, No.11B. L1567-L1570 (1995)
K.Ohya、K.Hiroi 和 J.Kawata:“等离子体辐照固体表面的二次电子发射模拟”Jpn.J.Appl.Phys.Vol.34,No.11B。
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
K.Ohya,K.Hiroi and J.Kawata: "Simulation of Secondary Electron Emission from Solid Surface Irradiated by Plasmas" Japanese Journal of Applied Physics. Vol.34. L1567-L1570 (1995)
K.Ohya、K.Hiroi 和 J.Kawata:“等离子体辐照固体表面的二次电子发射模拟”日本应用物理学杂志。
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36
    Simulation for evaluation of secondary electron signals in helium ion microscope
    • 批准号:
      24560029
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $3.33万
    • 财政年份:
      2012
    • 负责人:
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    • 依托单位:
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    • 批准号:
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    • 项目类别:
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    • 资助金额:
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    • 财政年份:
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    • 负责人:
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    • 依托单位:
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    • 批准号:
      09680494
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $1.6万
    • 财政年份:
      1997
    • 负责人:
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    • 依托单位:
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