Computer Simulation of Plasma-Surface Interactions in Fusion Devices
Computer Simulation of Plasma-Surface Interactions in Fusion Devices
批准号:
09680494
负责人:
OHYA Kaoru
金额:
$1.6万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1998
中文摘要
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英文摘要
A computer simulation code which treats plasma-surface interactions for divertor plates in magnetic confine-went fusion devices. The simulation code allows simultaneous incidence of different ion species as well as a Maxwellian velocity distribution and different charge states of the ions. The dynamic composition change of the surface layer due to ion implantation and redeposition of released impurities due to their ionization and gyromotion in an edge plasma.Particle release from a W test limiter exposed to deuterium edge plasma, containing impurities C and O, in the tokamak TEXTOR-94 is studied by using this simulation code. The release of W impurities from the limiter is strongly suppressed by prompt redeposition, whereas low Z impurities (C and O) are much less influenced. Expert- mentally observed radial distributions of WI and CII line intensities in front of the limiter can be explained by physical sputtering of W and deposited C, in addition to high-energy reflection of impurit … More y C ions. On the other hand, the CII line emission observed in front of graphite as a limiter is attributed to many low-energy atoms due to chemical sputtering by impact of D ions, which is strongly suppressed by deposition of high-Z impurities, such as W.Erosion of boron out of a thin film exposed to deuterium edge plasmas and the simultaneous carbon deposition in TEXTOR-94 is studied by simulation. The implantation of carbon impurities strangly changes the effective boron sputtering yield of the film, which results into a lowering of the film erosion and a formation of thick carbon deposits. A strong decrease in the experimentally observed Bill line emission around a surface location far from the plasma edge can be explained by a carbon deposition on the film. The cauculated carbon depth proflies in die film are in resonable agreement with measurements by AES.A combined Monte Carlo simulation of secondary electron emission from solids and transport of secondary electrons in a plasma sheath is performed for analyzing a relationship between the secondary electron yield and sheath voltage formed on the wall in magnetic fusion devices. Less
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大宅 薫: "スパッタリングと2次電子放出" プラズマ・核融合学会誌. Vol.75,No.4. (1999)
Kaoru Oya:“溅射和二次电子发射”等离子体与聚变科学学会杂志,第 75 卷,第 4 期(1999 年)。
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通讯作者:
K.Ohya, J.Kawata, A.Harada: "Dynamic simulation of sputtering of tungsten irradiated by plasmas in an oblique magnetic field" Radiation effects and Defects in Solids. Vo1.142. 401-413 (1997)
K.Ohya、J.Kawata、A.Harada:“斜磁场中等离子体辐照钨溅射的动态模拟”辐射效应和固体缺陷。
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K.Ohya,J.Kawata,T.Tanabe,M.Wada,T.Ohgo,et al.: "Particle emission from a tungsten test limiter in TEXTOR-94 : a comparison between experimental and Monte Carlo simulated results" Journal of Nuclear Materials. (in press). (1999)
K.Ohya,J.Kawata,T.Tanabe,M.Wada,T.Ohgo,et al.:“TEXTOR-94 中钨测试限制器的粒子发射:实验结果与蒙特卡罗模拟结果之间的比较”核杂志
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K.Ohya,J.Kawata,J.Wienhold,P.Karduck,et al.: "Boron erosion and carbon deposition due to simultaneous bombardment with deuterium and carbon ion in plasmas" Nuclear Instruments and Methods in Physics Research B. (in press). (1999)
K.Ohya,J.Kawata,J.Wienhold,P.Karduck,et al.:“由于等离子体中氘和碳离子同时轰击而导致的硼侵蚀和碳沉积”核物理研究中的仪器和方法 B.(出版中)
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N.Saji, K.Ohya: "Influence of impurity deposition on ion reflection and sputtering from low Z and high Z materials" Bulletin of Faculty of Engineering, The University of Tokushima. No.44, (in press). (1999)
N.Saji、K.Ohya:“杂质沉积对低 Z 和高 Z 材料的离子反射和溅射的影响”德岛大学工程学院通报。
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共 25 条
Simulation for evaluation of secondary electron signals in helium ion microscope
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批准号:24560029
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$3.33万
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财政年份:2012
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负责人:OHYA Kaoru
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依托单位:
Study of Secondary Electron Image Contrast of Sample Surfaces Scanned by Focused Ion Beams
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批准号:14550026
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.22万
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财政年份:2002
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负责人:OHYA Kaoru
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依托单位:
Computer Simulation of Secondary Electron Emission From Plasma Facing Materials in Controlled Fusion Devices
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批准号:06680481
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.28万
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财政年份:1994
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负责人:OHYA Kaoru
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依托单位:
海外基金