Development of evaluation system of optical elements for vacuum-ultra violet

真空紫外光学元件评价系统的研制

• 批准号: 14550094
• 负责人: OTANI Yukitoshi
• 金额: $ 1.73万
• 依托单位: Tokyo University Agriculture And Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2002
• 资助国家: 日本
• 起止时间: 2002 至 2003
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-14550094/
• 关键词: vacuum-ultra violet; Optical elements; F2 laser; birefringence; fluorescent glass; calcium fluoride

Semiconductors are highly integrated for the requirement of higher mass storage and high speed operation. The wavelength for exposure becomes shorter and shorter to improve high space resolution of lithography, because the space resolution of lithography depends on the wavelength. Now ArF laser is planning to be used for next generation of lithography and its resolution of line width is expected 90 nm. Moreover, the next next generation of lithography is intended to use a F2 (fluorine) laser in 157nm. There is little room for option of optical components except a calcium fluoride (CaF2). However it has birefringence dispersion such as true bireflingence. It means that birefringence increases in response to short wavelength. It is necessary to change the old way to measure by using visible light especially, He-Ne laser. Therefore we have to inspect optical components in the same wavelength. We propose a Mueller matrix polarimeter and interferometer for 1 57nm instead of birefringence measurement. Moreover, we purpose a novel image detection system for vacuum ultra-violet using a fluorescent glass. A vacuum Mueller matrix polarimeter is developed for measurement of the Muller matrix of samples, partially, calcium fluoride materials in 157nm wavelength. From the measured Mueller matrix with no sample present, we found the influence of absorption error in the detector and orientation error in quarter-wave plates on measurement results. The birefringence of samples is determind from the Mueller matrix. Experimental results show this Mueller matrix polarimeter is available to be used for characterizing the intrinsic birefringence of materials for processed lens at the 157nm lithography.

为了满足更高容量存储和高速操作的要求，半导体被高度集成。由于光刻的空间分辨率取决于波长，因此曝光波长变得越来越短以提高光刻的高空间分辨率。目前ArF激光器正计划用于下一代光刻技术，其线宽分辨率有望达到90 nm。此外，下一代光刻技术打算使用157 nm的F2（氟）激光。除了氟化钙（CaF 2）之外，几乎没有光学组件的选择余地。然而，它有双折射色散，如真正的双折射。这意味着双折射随着短波长的增加而增加。因此，有必要改变用可见光特别是He-Ne激光进行测量的旧方法。因此，我们必须在相同的波长下检查光学元件。提出了一种用于1.57nm波长的Mueller矩阵偏振计和干涉仪，以代替双折射测量。此外，我们还设计了一种新型的真空紫外荧光玻璃图像检测系统。研制了一种真空缪勒矩阵旋光仪，用于在157 nm波长下测量样品的缪勒矩阵，部分样品为氟化钙材料。从无样品时测量的穆勒矩阵中，我们发现了探测器吸收误差和四分之一波片取向误差对测量结果的影响。样品的双折射率由Mueller矩阵确定。实验结果表明，该穆勒矩阵偏振计可用于表征157 nm光刻加工透镜材料的本征双折射。

项目成果

Y.Otani, M.Takahashi, L.Jin, H.Kowa, N.Umeda: "Image detection system for 157 nm using fluorescent glass"Proc.SPIE. 5188. 134-137 (2003)

Y.Otani、M.Takahashi、L.Jin、H.Kowa、N.Umeda：“使用荧光玻璃的 157 nm 图像检测系统”Proc.SPIE。

L.H.Jin, H.Kowa, Y.Otani, N.Umeda: "Mueller matrix imaging polarimeter in 157nm"Proc.SPIE. Vol.5188. 146-153 (2003)

L.H.Jin、H.Kowa、Y.Otani、N.Umeda：“157nm 下的穆勒矩阵成像旋光计”Proc.SPIE。

Y.Otani, M.Takahashi, L.Jin, H.Kowa, N.Umeda: "Image detection system for 157 nm using fluorescent glass"Proc.SPIE. Vol.5188. 134-137 (2003)

Y.Otani、M.Takahashi、L.Jin、H.Kowa、N.Umeda：“使用荧光玻璃的 157 nm 图像检测系统”Proc.SPIE。

高橋政克, 若山俊隆, 金蓮花, 高和宏行, 大谷幸利, 梅田倫弘: "真空紫外領域における画像検出システム"Optics Japan 2002 日本光学会年次学術講演会講演予稿集. 146-147 (2002)

Masakatsu Takahashi、Toshitaka Wakayama、Renka Kin、Hiroyuki Takakazu、Yukitoshi Otani、Tomohiro Umeda：“真空紫外区域的图像检测系统”日本光学2002年日本光学学会年会学术会议论文集146-147（2002）。

L.H.Jin, H.Kowa, Y.Otani, N.Umeda: "Mueller matrix imaging polarimeter in 157nm"Proc.SPIE. 5188. 146-153 (2003)

L.H.Jin、H.Kowa、Y.Otani、N.Umeda：“157nm 下的穆勒矩阵成像旋光计”Proc.SPIE。