Nano-profilometry by spectroscopic Mueller matrix polarimeter

提出了一种基于散射测量技术的光谱米勒矩阵偏振计，用于评价纳米结构的表面轮廓。一般来说，对小于波长的表面轮廓结构进行成像是困难的。基于Mueller矩阵的极化特性检测可以测量纳米结构的表面轮廓。通过实验测量和严格耦合波分析（RCWA）的计算值，确定了表征样品所有极化特性的Mueller矩阵的纳米结构轮廓。

A spectroscopic Mueller matrix polarimeter which is based on a scatterometry technique is proposed to evaluate the surface profiles of nanostructures. In general, it is difficult to image surface profile structures that are smaller than the wavelength. The surface profiles of nanostructures can be measured by detecting polarization properties based on Mueller matrices. A nanostructure profile is determined from the Mueller matrix which expresses all the polarization properties of the sample by experimental measurements and calculated values using rigorous coupled-wave analysis (RCWA).