Development of high precision nano-particle jet deposition device and studies on deposition dynamics
Development of high precision nano-particle jet deposition device and studies on deposition dynamics
批准号:
18360064
负责人:
KURIYAGAWA Tsunemoto
金额:
$10.42万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2006
资助国家:
日本
项目状态:
已结题
起止时间:
2006 至 2007
中文摘要
In this study, accelerated ceramics particle,whose diameter is between several ten and several hundreds nano-meter orderThis film creation method is called This film creation method is called This film creation method is called This film creation method is callednano-particle jet deposition (PJD). gas-particle flow adjacent to the workpiece is measured by thePIV and deposition dynamics is estimated utilizing the FEM and MD simulation. Conclusions of this研究是follow. Flow rate of particle sprayed by the PJD device can be controlled between200~310m/s. In the case the flow rate is 200~275m/s, alumina particles (diameter:μm) remove the soda glass.·It is found that there is transition condition from deposition toremoval. And each size of particle has the different transition condition. When the particles hitthe workpiece,particles are fractured. MD simulation indicate that the optimum flow rate is 205~275m/s。
英文摘要
In this study, accelerated ceramics particle, whose diameter is between several ten and several hundreds nano-meter order, is sprayed to the workpiece on purpose to create film. This film creation method is called nano-particle jet deposition (PJD). gas-particle flow adjacent to the workpiece is measured by the PIV and deposition dynamics is estimated utilizing the FEM and MD simulation. Conclusions of this research is as follow.・Flow rate of particle sprayed by the PJD device can be controlled between 200~310m/s. In the case the flow rate is 200~275m/s, alumina particles (diameter: 2μm) remove the soda glass.・It is found that there is transition condition from deposition to removal. And each size of particle has the different transition condition.・When the particles hit the workpiece, particles are fractured.・MD simulation indicate that the optimum flow rate is 205~275m/s.
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Electrostatic Control of Micro-Nano Particle-Laden Supersonic Jet Impinging onto Substrate with Cavity in a Micro-space
微空间内载有微纳颗粒的超音速射流撞击带腔基底的静电控制
DOI:
--
发表时间:
2006
期刊:
Proc. of Sixth International Symposium on Advanced Fluid Information (AFI-2006), October 26-27, 2006, Chofu, Tokyo, Japan
影响因子:
--
作者:
[Hidemasa Takana, et al.]
通讯作者:
et al.
平滑化粒子法(SPH)による微粒子衝突現象の解析-パウダージェットデポジション法によるセラミックス膜創成に関する研究-
使用平滑粒子法(SPH)分析粒子碰撞现象 - 使用粉末喷射沉积法形成陶瓷膜的研究 -
DOI:
--
发表时间:
2007
期刊:
影响因子:
--
作者:
[森本國文, 乾正知, 森西洋平, 水谷公一]
通讯作者:
水谷公一
Creating a Hydroxyapatite Film on Human Enamel by Powder Jet Deposition Technique
通过粉末喷射沉积技术在人体牙釉质上形成羟基磷灰石薄膜
DOI:
--
发表时间:
2007
期刊:
Advances in Abrasive Technology X
影响因子:
--
作者:
[Noji M, M. S. Sepasy, Shibuya T, Yosihara N, Kuriyagawa T, Sasaki K, Suzuki T.]
通讯作者:
Suzuki T.
目標物に対する膜の形成方法及び装置
在目标物体上形成薄膜的方法和装置
DOI:
--
发表时间:
2007
期刊:
影响因子:
--
作者:
[]
通讯作者:
Development of double nozzle type powder jet deposition device - Study on powder jet deposition -
双喷嘴式喷粉沉积装置的研制 - 喷粉沉积研究 -
DOI:
--
发表时间:
2007
期刊:
Proceedings of the International Symposium on Advances in Abrasive Technology (IN PRESS)
影响因子:
--
作者:
[Toshihiko Shibuya, et al.]
通讯作者:
et al.
共 13 条
Multi-Physics Simulation of Powder Jet Deposition and Optimum Design of the Powder
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批准号:21246024
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$29.79万
-
财政年份:2009
-
负责人:KURIYAGAWA Tsunemoto
-
依托单位:
Development and evaluation of laser conditioning method for ultra-fine grid diamond wheel
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批准号:16360060
-
项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.86万
-
财政年份:2004
-
负责人:KURIYAGAWA Tsunemoto
-
依托单位:
DEVELOPMENT OF POWDER JET PROCESSING METHOD AND A MECHANISM CHANGE IN PROCESSES OF MATERIAL REMOVAL AND POWDER DEPOSITION
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批准号:13450051
-
项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.6万
-
财政年份:2001
-
负责人:KURIYAGAWA Tsunemoto
-
依托单位:
GENERATION OF MICRO-ICE JET AND SELECTIVE REMOVAL PROCESS OF RESINOID INSULATOR FILM FOR MULTIPLAYER SEMICONDUCTORS
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批准号:11450051
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项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$7.23万
-
财政年份:1999
-
负责人:KURIYAGAWA Tsunemoto
-
依托单位:
DEVELOPMENT AND EVALUATION OF PRECISION ABRASIVE JET MACHINING DEVICE
-
批准号:09555035
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$7.17万
-
财政年份:1997
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负责人:KURIYAGAWA Tsunemoto
-
依托单位:
BASIC STUDY OF ELECTRO REOLOGICAL FLUID ASSISTED ULTRA-PRECISION POLISHING FOR 3-DIMENSIONAL SMALL PARTS.
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批准号:08455066
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项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$5.63万
-
财政年份:1996
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负责人:KURIYAGAWA Tsunemoto
-
依托单位:
DEVELOPMENT OF ULTRA-PRECISION MACHINING SYSTEM FOR ASPHERIC MIRROR BASED ON ARC ENVELOPE GRINDING METHOD
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批准号:07555355
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$0.9万
-
财政年份:1995
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负责人:KURIYAGAWA Tsunemoto
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依托单位:
MICRO-MACHINING OF CERAMICS USING ABRASIVE-JET TECHNOLOGY
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批准号:06452156
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.86万
-
财政年份:1994
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负责人:KURIYAGAWA Tsunemoto
-
依托单位:
海外基金