Frontier science and technology of nanoblock transport and arrangement
Frontier science and technology of nanoblock transport and arrangement
批准号:
20360040
负责人:
SHIRATANI Masaharu
金额:
$11.65万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2010
中文摘要
在这个项目中,我们研究了纳米颗粒的传输、排列和沉积。我们得到了以下结果:(1)基片上的局域势结构使我们可以在基片上排列纳米颗粒。(2)新开发的二维原位激光散射方法有助于以二维的方式评价纳米颗粒的初始生长相。(3)纳米颗粒复合薄膜具有超低的k和高的杨氏髓质。(4)调幅脉冲放电有效地实现了对精细结构的沉积轮廓控制。
英文摘要
In this project, we have studied transport, arrangement and deposition of nanoparticles. We have obtained following results.(1) Localized potential structure on substrates allows us to arrange nanoparticles on the substrates.(2) Novel developed 2-dementional in-situ laser light scattering method is useful for evaluating the initial growth phase of nanoparticles in 2-d ways.(3) Nanoparticle-composit films show ultra low-k and high Young's medullas.(4) Amplitude modulated pulse discharges are effective for realizing deposition profile control on fine structures.
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Chapter 31. Title : "Nano-block Assembly Using RF Discharge with Amplitude Modulation (Wiley-VCH Verlag GmbH & Co.)
第 31 章标题:“使用射频放电和幅度调制的纳米块组装(Wiley-VCH Verlag GmbH)
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[S.Iwashita, H.Mityata, K.Koga, M.Shiratani]
通讯作者:
M.Shiratani
Industrial Plasma Technology Chapter 31. Title : "Nano-block Assembly Using RF Discharge with Amplitude Modulation" (pp.377-383)
工业等离子技术第 31 章。标题:“使用射频放电和幅度调制的纳米块组装”(第 377-383 页)
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[S.Iwashita, H.Mityata, K.Koga, M.Shiratani]
通讯作者:
M.Shiratani
Carbon Dust Particles Generated Due to H_2 Plasma-Carbon Wall Interaction
H_2等离子体-碳壁相互作用产生的碳尘颗粒
DOI:
--
发表时间:
2010
期刊:
Proceedings of 63^<rd> Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas
影响因子:
--
作者:
[H.Miyata, K.Nishiyama, S.Iwashita, H.Matsuzaki, D.Yamashita, G.Uchida, N.Itagaki, K.Kamataki, K.Koga, M.Shiratani, N.Ashikawa, S.Masuzaki, K.Nishimura, A.Sagara LHDexperimentalGroup]
通讯作者:
A.Sagara LHDexperimentalGroup
Plasma manipulation of nano-blocks and its application to ULK film deposition
纳米块的等离子体操控及其在 ULK 薄膜沉积中的应用
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[M.Shiratani, K.Koga, 他3名]
通讯作者:
他3名
Rapid deposition of porous ultra low-k films using pulse RF discharges with amplitude modulation
使用调幅脉冲射频放电快速沉积多孔超低 k 薄膜
DOI:
--
发表时间:
2008
期刊:
影响因子:
--
作者:
[S. IWASHITA, H. MIYATA, H. MATSUZAKI, K. KOGA, M. SHIRATANI, Shinya Iwashita, Shinya Iwashita, Shinya Iwashita, Shinya Iwashita, 岩下伸也, 岩下伸也, 岩下伸也, Shinya Iwashita, Shinya Iwashita, 岩下伸也, 岩下伸也, Shinya Iwashita, Shinya Iwashita, Shinya Iwashita, Shinya Iwashita, Shinya Iwashita, Shinya Iwashita, 岩下伸也, 岩下伸也, Shinya Iwashita]
通讯作者:
Shinya Iwashita
共 42 条
Growth promotion by cell-cycle synchronized pulse plasmas
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批准号:22656022
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.34万
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财政年份:2010
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负责人:SHIRATANI Masaharu
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依托单位:
Plasma Anisotropic CVD for Cu Interconnects in LSI
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批准号:14350021
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.54万
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财政年份:2002
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负责人:SHIRATANI Masaharu
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依托单位:
Development of simultaneous in-situ measurements of size, density, and refractive index of particles in rf silane plasmas using a polarization-sensitive laser-light-scattering method
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批准号:06555023
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项目类别:Grant-in-Aid for Developmental Scientific Research (B)
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资助金额:$3.46万
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财政年份:1994
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负责人:SHIRATANI Masaharu
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依托单位: