Low Friction Properties of Si-Incorporated DLC Coatings Treated with Oxygen Plasma

氧等离子体处理的掺硅 DLC 涂层的低摩擦性能

• 批准号: 20360073
• 负责人: CHOI Junho
• 金额: $ 11.81万
• 依托单位: The University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2008
• 资助国家: 日本
• 起止时间: 2008 至 2010
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-20360073/
• 关键词: トライボロジー; 固体薄膜; 潤滑; 摩擦; 表面・界面物性; Si-DLC; 酸素プラズマ; 移着層

In this study, the effects of silicon oxide layer on frictional properties of Si-DLC coatings were investigated by controlling the amount of silicon oxide on Si-DLC coatings. The amount of silicon oxide on the Si-DLC coating was controlled by oxygen plasma treatment for 30-300 s. In a result, the amount of silicon oxide on the top surface of Si-DLC coating increases with the increasing treatment time of oxygen plasma. The friction coefficients of Si-DLC coatings with 3-7at.%Si decrease to 0.02 due to oxygen plasma treatment, which is the lower value than that of Si-DLC coating with 13at.%Si. The surface hardness of Si-DLC coatings is slightly reduced by oxygen plasma treatment due to formation of silicon oxide on the top surface, whereas the hardness of wear track exhibits the same value to Si-DLC coating before oxygen plasma treatment. The Si-rich oxide layer formed on the Si-DLC coating plays roll of scarifying layer to reduce friction coefficient. The oxygen plasma treatment is effective to reduce the friction coefficient without hardness reduction in the entire Si-DLC coating.

本研究通过控制Si-DLC涂层上氧化硅的含量，研究了氧化硅层对Si-DLC涂层摩擦性能的影响。 Si-DLC涂层上氧化硅的量通过氧等离子体处理30-300秒来控制。结果表明，随着氧等离子体处理时间的增加，Si-DLC涂层上表面的氧化硅含量增加。经过氧等离子体处理，Si-DLC涂层的摩擦系数为3-7at.%，降至0.02，低于13at.%Si的Si-DLC涂层。由于顶表面形成氧化硅，氧等离子体处理后Si-DLC涂层的表面硬度略有降低，而磨损轨迹的硬度与氧等离子体处理前的Si-DLC涂层表现出相同的值。 Si-DLC涂层上形成的富硅氧化层起到划伤层的作用，降低摩擦系数。氧等离子体处理可有效降低摩擦系数，且不会降低整个Si-DLC涂层的硬度。

项目成果

原子シミュレーションを用いたシリコンを含むアモルファスカーボン構造の検討

利用原子模拟研究含硅的非晶碳结构

• 发表时间: 2008
• 作者: 熊谷知久;澤井周;蘭恵清;崔〓豪;加藤孝久
• 通讯作者: 加藤孝久

Observation of Self-Assembled Monolayers on Diamond-Like Carbon Films

类金刚石碳膜上自组装单分子层的观察

• 发表时间: 2009
• 作者: J Choi;K Sakurai;T Kato
• 通讯作者: T Kato

Thermal Stability of SiBCN Films

SiBCN 薄膜的热稳定性

• 发表时间: 2008
• 期刊: Tribology Online 3(5)
• 作者: N Hayashi;J Choi;T Kumagai;T Kato;M Kawaguchi;S Nakao;M Ikeyama
• 通讯作者: M Ikeyama

Nitriding of high speed steel by bipolar PBII for improvement in adhesion strength of DLC films

双极PBII对高速钢渗氮以提高DLC膜的结合强度

• 发表时间: 2011
• 期刊: Nuclear Instruments & Methods in Physics Research B
• 作者: J Choi;K Soejima;T Kato;M Kawaguchi;W Lee
• 通讯作者: W Lee

Observation of self-assembledmonolayers on diamond-like carbon films : agglomeration of self-assembled FDTS molecules

类金刚石碳膜上自组装单分子层的观察：自组装 FDTS 分子的团聚

• 发表时间: 2010
• 期刊: Surface and Interface Analysis (印刷中(掲載確定))
• 作者: J Choi;K Sakurai;T Kato
• 通讯作者: T Kato