Creation and annihilation of conductive nanowires in insulators

绝缘体中导电纳米线的产生和消灭

• 批准号: 20510108
• 负责人: KYUNO Kentaro
• 金额: $ 3万
• 依托单位: Shibaura Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2008
• 资助国家: 日本
• 起止时间: 2008 至 2010
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-20510108/
• 关键词: メモリ; 酸化物; ナノ細線; ReRAM; スイッチング; RRAM

The forming process in planar-type Cu_2O resistive switching devices is investigated. It is found that two forming processes occur in series, and the existence of a Cu filament is directly confirmed using transmission electron microscopy after each forming process. The time evolution of the surface is observed by an optical microscope during these processes. The first process accompanies the oxidation of the Cu_2O surface, and the filament is created～15 m below the surface ; the second process involves melting of the region between the electrodes with the creation of a new filament～1μm below the surface.

研究了平面型Cu_2O阻变器件的形成过程。结果发现，两个形成过程中发生串联，并直接确认每个形成过程后，使用透射电子显微镜的Cu丝的存在。在这些过程中，通过光学显微镜观察表面的时间演化。第一个过程伴随着Cu_2O表面的氧化，在表面以下约15 μ m处产生细丝;第二个过程涉及电极之间的区域熔化，在表面以下约1μm处产生新的细丝。

项目成果

Observation of the Creation and Annihilation of Local Current Paths in HfO2 Thin Films on Pt by Ultrahigh-Vacuum Conductive Atomic Force Microscopy: Evidence of Oxygen Spill Over during the Forming Process

用超高真空导电原子力显微镜观察 Pt 上 HfO2 薄膜局部电流路径的产生和湮灭：形成过程中氧气溢出的证据

• DOI: 10.1143/jjap.48.060202
• 发表时间: 2009
• 期刊: Japanese Journal of Applied Physics
• 影响因子: 1.5
• 作者: Naotaka Sasaki;K. Kita;A. Toriumi;K. Kyuno
• 通讯作者: K. Kyuno

Two-Step Forming Process in Planar-Type Cu2O-Based Resistive Switching Devices

平面型 Cu2O 基电阻开关器件的两步成型工艺

• DOI: 10.1143/apex.4.051801
• 发表时间: 2011
• 期刊: Applied Physics Express
• 影响因子: 2.3
• 作者: Kazunori Suzuki;Norihide Igarashi;K. Kyuno
• 通讯作者: K. Kyuno

Two-Step Forming Process in Planar-Type Cu_2O-Based Resistive Switching Device

平面型Cu_2O基阻变器件的两步成型工艺

• 发表时间: 2011
• 期刊: Applied Physics Express
• 影响因子: 2.3
• 作者: Y. Shiraishi;M. Hashimura;M. Nakao;T. Ishizu Y. Miyamoto and N. Toshima;K.Suzuki
• 通讯作者: K.Suzuki

Observation of the Creations and Annihilations of Local Current Paths in HfO_2 thin films on Pt by Ultrahigh Vacuum Conductive-Atomic Force Microscopy : Evidence of Oxygen Spill Over during the Forming Process

超高真空导电原子力显微镜观察Pt上HfO_2薄膜局部电流路径的产生和湮灭：形成过程中氧气溢出的证据

• 发表时间: 2009
• 期刊: Japanese Journal of Applied Physics 48
• 作者: N.Sasaki;K.Kita;A.Toriumi;K.Kyuno
• 通讯作者: K.Kyuno

平面型ReRAM素子におけるフォーミング現象初期過程の直接観察

直接观察平面 ReRAM 器件形成现象的初始过程

• 发表时间: 2010
• 作者: 鈴木和典;弓野健太郎
• 通讯作者: 弓野健太郎