Development of safe and reliable sensor/actuator device made from multiferroics materials
Development of safe and reliable sensor/actuator device made from multiferroics materials
批准号:
21560727
负责人:
YAJIMA Zenjiro
金额:
$3.0万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2011
中文摘要
点击翻译按钮获取中文摘要
英文摘要
We developed an RF magnetron sputtering system equipped with separate sources as well as with a heating and ion-irradiation system for substrates. The ion irradiation system is basically similar to PBII & D(plasma based ion implantation and deposition) system which was applied to surface modification of plastic bottle, ion implantation for polymeric materials, deposition of a diamond-like carbon film, and so on. The hardness and fexlibility of the DLC formed by the developed system can be widely changed by adequately selecting RF power, pulse bias voltage, gas species and gas pressure.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
登录
查看更多内容
Relation of the Polymeric Ion Species in Plasma to the Hardness of a-C : H Film Made by PSII & D
等离子体中聚合离子种类与 a-C 硬度的关系:PSII 制造的 H 膜
DOI:
--
发表时间:
2011
期刊:
Surface and Coatings Technology
影响因子:
5.4
作者:
[T. Mizusaki, K. Kaneko, M. Honma, T. Sakurai, R.O, Noriaki Ikenaga]
通讯作者:
Noriaki Ikenaga
Shape Memory Behavior of TiNi Alloy Films Sputter-Deposited on Polyimide Substrate
聚酰亚胺基片溅射沉积 TiNi 合金薄膜的形状记忆行为
DOI:
--
发表时间:
2011
期刊:
Journal of Alloy and Compounds
影响因子:
--
作者:
[V.Darakchieva, K.Lorenz, M.-Y.Xie, N.P.Barradas, E.Alves, W.J.Schaff, C.L.Hsiao, L.C.Chen, L.W.Tu, T.Yamaguchi, Y.Nanishi, Yoichi Kish]
通讯作者:
Yoichi Kish
PSII&DにおけるプラズマパラメータとDLC膜硬度の関係
PSII&D中等离子体参数与DLC膜硬度的关系
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[N. Ikenaga, Y. Kishi, Z. Yajima, N. Sakudo, N. Ikenaga, Y. Kishi, Y. Kishi, N. Sakudo, N. Sakudo, N. Ikenaga, H. Yasui, N.Ikenaga, N.Sakudo, 岸陽一, 岸陽一, 作道訓之, 作道訓之, 岸陽一, 岸陽一, N.Sakudo, 岸陽一, 岸陽一, 池永訓昭]
通讯作者:
池永訓昭
イオン照射とスパッタリングを併用したTiNi薄膜の低温結晶化
利用离子辐照和溅射技术低温结晶 TiNi 薄膜
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[林忠之, 立木実, 何東風, 糸崎秀夫, 作道訓之, T. Hayashi, 作道訓之, T. Hayashi, N. Ikenaga, T. Hayashi, N.Ikenaga, T. Hayashi, 作道訓之]
通讯作者:
作道訓之
DOI:
10.1051/esomat/200902012
发表时间:
2009
期刊:
影响因子:
--
作者:
[Y. Kishi;N. Ikenaga;N. Sakudo;Z. Yajima]
通讯作者:
Y. Kishi;N. Ikenaga;N. Sakudo;Z. Yajima
共 54 条
Development of Shape Memory Alloy Films for Micro-Actuator - Various Characteristics by Using Ion Beam Modification -
-
批准号:18560680
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.47万
-
财政年份:2006
-
负责人:YAJIMA Zenjiro
-
依托单位:
Study on Interface Properties of Ti-Ni Shape Memory Films Sputtered on Si substrate
-
批准号:12650703
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$1.86万
-
财政年份:2000
-
负责人:YAJIMA Zenjiro
-
依托单位:
Establishment of The Inspection Technique for Strength of Ti-Ni Shape Memory Alloys And Its Clarifying The Fracture Mechanisms
-
批准号:09650121
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.05万
-
财政年份:1997
-
负责人:YAJIMA Zenjiro
-
依托单位: