Next generation mesoplasma SIEMENS technology for direct production of wafer-equivalent thin film solar cells

该项目旨在开发下一代中间等离子体西门子技术，用于直接生产晶圆等效薄膜太阳能电池。特别注意理解的纳米团簇辅助快速外延的机制，也是激发的原子氢的绝对密度的原位测量，这两者都是中间等离子体的核心，以及具有成本效益的生产系统的技术发展。基于这些知识和理解，我们通过展示超快外延沉积的高材料产量，超过了西门子技术的动力学极限，证明了介观等离子体CVD的独特特性。

This project aims at the development of next generation mesoplasma SIEMENS technology for direct production of wafer-equivalent thin film solar cells. Special attentions were paid to understanding the mechanisms of the nano-cluster assisted fast rate epitaxy and also to an in-situ measurement of the absolute density of the excited atomic hydrogen, both of which are the core of the mesoplasma, together with the technological development of the cost effective production system. Based on these knowledge and understandings, we have proved the unique characteristics of mesoplasma CVD by demonstrating the ultrafast epitaxial deposition with high material yields that exceeds beyond the kinetics limit of the SIEMENS technology.