Next generation mesoplasma SIEMENS technology for direct production of wafer-equivalent thin film solar cells

该项目旨在开发下一代中等离子体西门子技术，用于直接生产晶圆等效薄膜太阳能电池。本文特别关注了纳米团簇辅助快速外延的机理，以及激发原子氢的绝对密度的原位测量，这两者都是中等离子体的核心，以及成本有效的生产系统的技术发展。基于这些知识和理解，我们证明了中等离子体CVD的独特特性，展示了超快外延沉积的高材料产量，超出了西门子技术的动力学极限。

This project aims at the development of next generation mesoplasma SIEMENS technology for direct production of wafer-equivalent thin film solar cells. Special attentions were paid to understanding the mechanisms of the nano-cluster assisted fast rate epitaxy and also to an in-situ measurement of the absolute density of the excited atomic hydrogen, both of which are the core of the mesoplasma, together with the technological development of the cost effective production system. Based on these knowledge and understandings, we have proved the unique characteristics of mesoplasma CVD by demonstrating the ultrafast epitaxial deposition with high material yields that exceeds beyond the kinetics limit of the SIEMENS technology.