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Study of flashmemory using organic and molecular materials

Study of flashmemory using organic and molecular materials
使用有机分子材料的闪存研究
批准号:
21360012
负责人:
NAKAJIMA Anri
金额:
$12.23万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2011

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中文摘要
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英文摘要
A gate stack structure with an organic-polymer tunneling gate insulator on a C_60-containing organic-polymer layer was developed for use as nonvolatile flash memory. Examination of the memory characteristics revealed substantial flatband voltage shifts for carrier injection into C_60 molecules. A long retention time was obtained for electron injection. Charge redistribution phenomena were observed in the electron retention characteristics immediately after the bias voltage application was terminated.
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DOI: 10.1063/1.4767132
发表时间: 2012-11-19
期刊: APPLIED PHYSICS LETTERS
影响因子: 4
作者: [Nakajima, Anri, Uchino, Masatoshi]
通讯作者: Uchino, Masatoshi
Research of reliable Ge transistor having atomic layer deposited gate dielectrics
  • 批准号:
    19360164
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 资助金额:
    $11.98万
  • 财政年份:
    2007
  • 负责人:
    NAKAJIMA Anri
  • 依托单位:
Flash memory having a few numbers of floating nanometer-scale dot and atomic-layer-deposited tunnel gate dielectrics
  • 批准号:
    16360176
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 资助金额:
    $6.85万
  • 财政年份:
    2004
  • 负责人:
    NAKAJIMA Anri
  • 依托单位:
Continuous Atomic-Layer Deposition of Metal Gate/High-k Metal Oxide Gate Dielectric Stack Structure
  • 批准号:
    13450129
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
  • 资助金额:
    $7.17万
  • 财政年份:
    2001
  • 负责人:
    NAKAJIMA Anri
  • 依托单位:
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