Development of filtered-arc-deposition source with activated anode and preparation of functional-amorphous carbon film
Development of filtered-arc-deposition source with activated anode and preparation of functional-amorphous carbon film
批准号:
21360131
负责人:
TAKIKAWA Hirofumi
金额:
$11.65万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2011
中文摘要
在真空电弧等离子体功能薄膜沉积装置方面,我们设计并研制了一种新型的过滤电弧沉积系统,用于在DLC薄膜中掺杂异种元素,制备高质量(高平整度、均匀性、无液滴)DLC薄膜。对器件性能进行了评价,并制备了异种元素掺杂DLC膜。
英文摘要
About a functional film deposition apparatus using the vacuum arc discharge plasma, we designed and developed a new filtered-arc-deposition system for doping dissimilar element into DLC film and preparing high-quality(high smoothness, uniform and droplet-free) DLC film. Apparatus function was assessed and dissimilar element doped DLC film was prepared.
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Removal of diamond-like carbon film by oxygen-dominated plasma beam converted from filtered carbon-cathodic arc
过滤碳阴极电弧转化的氧主导等离子束去除类金刚石碳膜
DOI:
--
发表时间:
2011
期刊:
Japanese Journal of Applied Physics
影响因子:
1.5
作者:
[H. Tanoue, M. Kamiya, Y. Suda, S. Oke, H. Takikawa, Y. Hasegawa, M. Taki, N. Tsuji, T. Ishikawa, H. Yasui]
通讯作者:
H. Yasui
Ashing of DLC film by oxygen plasma beam converted from filtered carbon-cathodic-arc
过滤碳阴极电弧转化的氧等离子束灰化 DLC 薄膜
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[T. Sakamoto, T. Iida, S. Kurosaki, K. Yano, H. Taguchi, K. Nishio, and Y. Takanashi, 松井幹彦, 田上英人]
通讯作者:
田上英人
高品質DLC膜形成に向けた真空アークプラズマビームの制御
真空电弧等离子束控制可形成高质量 DLC 薄膜
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[Shinichiro MUROOKA, Keisuke TOMODA, Nobukazu HOSHI, Junnosuke HARUNA, Meifen CAO, Atsuhiro YOSHIZAKI and Keiichi HIRATA, 滝川浩史]
通讯作者:
滝川浩史
フィルタードアーク蒸着法で形成したDLC膜の膜質に及ぼす基板バイアスの影響
基底偏压对过滤电弧蒸镀法形成DLC膜膜质量的影响
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[Qi Zhang, Xiangdong Sun, Yanru Zhong, Biying Ren and Mikihiko Matsui, 柏木大幸]
通讯作者:
柏木大幸
真空アークプラズマを用いたDLC:Si:H膜の合成
采用真空电弧等离子体合成 DLC:Si:H 薄膜
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[加藤, 佐野, 鈴置, 須藤利文, 田上英人]
通讯作者:
田上英人
共 65 条
Advancement of Filtered Arc Deposition System and Fabrication and Processing of High-Quality Hydrogen-Free DLC Films
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批准号:24246048
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$30.12万
-
财政年份:2012
-
负责人:TAKIKAWA Hirofumi
-
依托单位:
Feasibility study on solar energy converter using nanotube electron emitter
-
批准号:23656197
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.5万
-
财政年份:2011
-
负责人:TAKIKAWA Hirofumi
-
依托单位:
Development of Mass-Production Technique of Carbon Nanohorn Based on Arc discharge Method
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批准号:15310087
-
项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.45万
-
财政年份:2003
-
负责人:TAKIKAWA Hirofumi
-
依托单位:
High Speed Production of Nanotube film for Cold Cathode Electron Emitter and Its Property Evaluation
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批准号:13650342
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.56万
-
财政年份:2001
-
负责人:TAKIKAWA Hirofumi
-
依托单位:
海外基金