Development of surface figure metrology system based on stitching interferometric method for hard x-ray nano-focusing mirrors

基于拼接干涉法的硬X射线纳米聚焦镜面形测量系统研制

• 批准号: 21760106
• 负责人: YUMOTO Hirokatsu
• 金额: $ 2.91万
• 依托单位: Japan Synchrotron Radiation Research Institute
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Young Scientists (B)
• 财政年份: 2009
• 资助国家: 日本
• 起止时间: 2009 至 2010
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-21760106/
• 关键词: 表面形状計測; X線ミラー; スティッチング干渉計; X線光学素子; X線ナノ集光; 回転楕円面ミラー

In this study, we aimed at the realization of hard-x-ray nano-focusing beam using mirror optics. We developed a surface figure metrology system to measure nano-focusing mirror surface. We built a stitching interferometric system by using a white light microscopic interferometer. In this system, the microscopic interferometer measures local surface area of mirror surface, and at the same time, relative angle between local surface areas is measured by using another interferometer. This enables to measure entire mirror surface profile with an accuracy of a nanometer level.

本研究旨在利用反射镜光学实现硬X射线纳米聚焦。研制了一套用于纳米聚焦镜表面形貌测量的表面形貌测量系统。利用白色光显微干涉仪建立了一套拼接干涉系统。在该系统中，显微干涉仪测量镜面的局部表面积，同时，局部表面积之间的相对角度测量通过使用另一个干涉仪。这使得能够以纳米级的精度测量整个镜面轮廓。

项目成果

Surface figure metrology system for hard x-ray sub-10-nm focusing mirrors.

用于硬 X 射线亚 10 nm 聚焦镜的表面形状计量系统。

• 发表时间: 2011
• 作者: Hirokatsu Yumoto;Hidekazu Mimura,Takashi Kimura;Satoshi Matsuyama;Yasuhisa Sano;Haruhiko Ohashi,Kazuto Yamauchi;Tetsuya Ishikawa.
• 通讯作者: Tetsuya Ishikawa.