Development of surface figure metrology system based on stitching interferometric method for hard x-ray nano-focusing mirrors

在本研究中，我们的目标是利用镜面光学来实现硬X射线纳米聚焦光束。研制了一套用于测量纳米聚焦镜面形的面形测量系统。利用白光显微干涉仪搭建了拼接干涉系统。在该系统中，显微干涉仪测量镜面的局部表面积，同时利用另一台干涉仪测量局部表面积之间的相对角度。这使得能够以纳米级的精度测量整个镜面轮廓。

In this study, we aimed at the realization of hard-x-ray nano-focusing beam using mirror optics. We developed a surface figure metrology system to measure nano-focusing mirror surface. We built a stitching interferometric system by using a white light microscopic interferometer. In this system, the microscopic interferometer measures local surface area of mirror surface, and at the same time, relative angle between local surface areas is measured by using another interferometer. This enables to measure entire mirror surface profile with an accuracy of a nanometer level.